Ag2Te/As2S3: A high-contrast, top-surface imaging resist for 193 nm lithography
1996 ◽
Vol 14
(6)
◽
pp. 3489
◽
Keyword(s):
2000 ◽
Vol 18
(5)
◽
pp. 2551
◽
Keyword(s):
1999 ◽
Vol 12
(4)
◽
pp. 679-686
◽
Top surface imaging process and materials development for 193 nm and extreme ultraviolet lithography
1998 ◽
Vol 16
(6)
◽
pp. 3722
◽
1998 ◽
Vol 37
(Part 1, No. 12B)
◽
pp. 6734-6738
◽
1994 ◽
Vol 12
(6)
◽
pp. 3925
◽