Ag2Te/As2S3: A high-contrast, top-surface imaging resist for 193 nm lithography

Author(s):  
Jerome M. Lavine
1998 ◽  
Author(s):  
John M. Hutchinson ◽  
Veena Rao ◽  
Guojing Zhang ◽  
Adam R. Pawloski ◽  
Carlos A. Fonseca ◽  
...  

Author(s):  
Mark H. Somervell ◽  
David S. Fryer ◽  
Brian Osborn ◽  
Kyle Patterson ◽  
Jeffrey Byers ◽  
...  

1998 ◽  
Vol 41-42 ◽  
pp. 347-350
Author(s):  
D.W. Johnson ◽  
M.I. Egbe ◽  
C. Chen ◽  
Y. Liao ◽  
S. Dionisio ◽  
...  

1999 ◽  
Vol 12 (4) ◽  
pp. 679-686 ◽  
Author(s):  
Fumikatsu Uesawa ◽  
Masao Saito ◽  
Atsushi Sekiguchi ◽  
Koichi Takeuchi ◽  
Shigeru Moriya

1999 ◽  
Author(s):  
Myoung-Soo Kim ◽  
Hyoung-Gi Kim ◽  
Hyeong-Soo Kim ◽  
Ki-Ho Baik ◽  
Donald W. Johnson ◽  
...  

1998 ◽  
Vol 37 (Part 1, No. 12B) ◽  
pp. 6734-6738 ◽  
Author(s):  
Shigeyasu Mori ◽  
Koichi Kuhara ◽  
Taku Morisawa ◽  
Nobuyuki Matsuzawa ◽  
Yuko Kaimoto ◽  
...  

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