Actinic patterned mask inspection for EUV lithography

2021 ◽  
Author(s):  
Hiroki Miyai ◽  
Tsunehito Kohyama ◽  
Toshiyuki Todoroki
Keyword(s):  
Euv Lithography ◽  
Mask Inspection

Aspects of nanometer scale imaging with extreme ultraviolet (EUV) laboratory sources

2012 ◽  
Vol 20 (1) ◽  
pp. 1-14 ◽  
Author(s):  
P. Wachulak ◽  
M. Marconi ◽  
A. Isoyan ◽  
L. Urbanski ◽  
A. Bartnik ◽  
...  
Keyword(s):  
Spatial Resolution ◽  
Extreme Ultraviolet ◽  
Fresnel Zone ◽  
Imaging Techniques ◽  
Imaging Systems ◽  
Short Exposure ◽  
Short Exposure Time ◽  
Euv Lithography ◽  
Mask Inspection ◽  
2D And 3D

AbstractImaging systems with nanometer resolution are instrumental to the development of the fast evolving field of nanoscience and nanotechnology. Decreasing the wavelength of illumination is a direct way to improve the spatial resolution in photon-based imaging systems and motivated a strong interest in short wavelength imaging techniques in the extreme ultraviolet (EUV) region. In this review paper, various EUV imaging techniques, such as 2D and 3D holography, EUV microscopy using Fresnel zone plates, EUV reconstruction of computer generated hologram (CGH) and generalized Talbot self-imaging will be presented utilizing both coherent and incoherent compact laboratory EUV sources. Some of the results lead to the imaging with spatial resolution reaching 50 nm in a very short exposure time. These techniques can be used in a variety of applications from actinic mask inspection in the EUV lithography, biological imaging to mask-less lithographic processes in nanofabrication.

Quantitative tabletop coherent diffraction imaging microscope for EUV lithography mask inspection

2014 ◽  
Author(s):  
Bosheng Zhang ◽  
Daniel E. Adams ◽  
Matthew D. Seaberg ◽  
Dennis F. Gardner ◽  
Elisabeth R. Shanblatt ◽  
...  
Keyword(s):  
Coherent Diffraction Imaging ◽  
Euv Lithography ◽  
Diffraction Imaging ◽  
Mask Inspection

Plasma-based sources of extreme ultraviolet radiation for lithography and mask inspection

2018 ◽  
Vol 189 (03) ◽  
pp. 323-334 ◽  
Author(s):  
D.B. Abramenko ◽  
P.S. Antsiferov ◽  
D.I. Astakhov ◽  
Aleksandr Yu. Vinokhodov ◽  
Il'ya Yu. Vichev ◽  
...  
Keyword(s):  
Ultraviolet Radiation ◽  
Extreme Ultraviolet ◽  
Mask Inspection ◽  
Extreme Ultraviolet Radiation

Status of the liquid-xenon-jet laser-plasma source for EUV lithography

2002 ◽  
Author(s):  
Bjoern A. M. Hansson ◽  
Lars Rymell ◽  
Magnus Berglund ◽  
Oscar E. Hemberg ◽  
Emmanuelle Janin ◽  
...  
Keyword(s):  
Laser Plasma ◽  
Plasma Source ◽  
Liquid Xenon ◽  
Euv Lithography

Study of advanced mask inspection optics with super-resolution method for next-generation mask fabrication

2009 ◽  
Author(s):  
Ryoichi Hirano ◽  
Masatoshi Hirono ◽  
Riki Ogawa ◽  
Nobutaka Kikuiri ◽  
Kenichi Takahara ◽  
...  
Keyword(s):  
Super Resolution ◽  
Next Generation ◽  
Resolution Method ◽  
Mask Inspection ◽  
Mask Fabrication

Toward the In Situ Remediation of Carbon Deposition on Ru-Capped Multilayer Mirrors Intended for EUV Lithography:  Exploiting the Electron-Induced Chemistry

2007 ◽  
Vol 111 (33) ◽  
pp. 12165-12168 ◽  
Author(s):  
David J. Davis ◽  
Georgios Kyriakou ◽  
Robert B. Grant ◽  
Mintcho S. Tikhov ◽  
Richard M. Lambert
Keyword(s):  
Carbon Deposition ◽  
In Situ Remediation ◽  
Multilayer Mirrors ◽  
Euv Lithography

Design-Aware Mask Inspection

2012 ◽  
Vol 31 (5) ◽  
pp. 690-702 ◽  
Author(s):  
Abde Ali Kagalwalla ◽  
Puneet Gupta ◽  
Christopher J. Progler ◽  
Steve McDonald
Keyword(s):  
Mask Inspection
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