Direct laser writing on silicon surface for large area nanoplasmonic devices

Author(s):  
Akshdeep Sharma ◽  
Bhargav G ◽  
Ajay Kaushal ◽  
K N Bhat ◽  
Ambarish Ghosh
1983 ◽  
Vol 29 ◽  
Author(s):  
Irving P. Herman ◽  
Bruce M. Mcwilliams ◽  
Fred Mitlitsky ◽  
Hon Wah Chin ◽  
Roderick A. Hyde ◽  
...  

ABSTRACTThe processes involved in the fabrication of micron-dimension transistors and small-scale integrated circuits using only the technique of direct laser-writing by localized pyrolytic surface reactions are discussed. New experimental findings in the deposition of tungsten by silicon. surface reduction of tungsten hexafluoride and doped polysilicon are presented. The techniques used to fabricate laser beam-written n-MOSFET's are being extended to make unipolar JFET's and bipolar lateral pnp transistors.


Author(s):  
Renato Grigolon Capelo ◽  
Juliana M.P. Almeida ◽  
Douglas Faza Franco ◽  
Gael Yves Poirier ◽  
Cleber Renato Mendonça ◽  
...  

2013 ◽  
Vol 3 (10) ◽  
pp. 1660 ◽  
Author(s):  
Wei-Er Lu ◽  
Yong-Liang Zhang ◽  
Mei-Ling Zheng ◽  
Yan-Peng Jia ◽  
Jie Liu ◽  
...  

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