High-order field distortion correction using standalone alignment technology with modeling and sampling optimization

2020 ◽  
Author(s):  
Takehisa Yahiro ◽  
Katsushi Makino ◽  
Haruki Saito ◽  
Steven Tottewitz ◽  
Boris Habets ◽  
...  
Keyword(s):  
High Order ◽  
Distortion Correction ◽  
Field Distortion ◽  
Sampling Optimization ◽  
High Order Field

A simple and rapid method for electromagnetic field distortion correction when using two Fastrak sensors for biomechanical studies

2008 ◽  
Vol 41 (8) ◽  
pp. 1813-1817 ◽  
Author(s):  
Nicola Hagemeister ◽  
Gerald Parent ◽  
Sabine Husse ◽  
Jacques A. de Guise
Keyword(s):  
Electromagnetic Field ◽  
Rapid Method ◽  
Distortion Correction ◽  
Field Distortion

Advanced high order field-to-field modeling for wafer edge control

2020 ◽  
Author(s):  
Boris Habets ◽  
Stefan Buhl ◽  
Wan-Soo Kim ◽  
Patrick Lomtscher ◽  
Holger Bald ◽  
...  
Keyword(s):  
High Order ◽  
Field Modeling ◽  
High Order Field ◽  
Wafer Edge

Effect of high-order field corrections in electron scattering by intense laser beams in vacuum

2001 ◽  
Vol 55 (4) ◽  
pp. 492-498
Author(s):  
J. X Wang ◽  
W Scheid ◽  
M Hoelss ◽  
Y. K Ho ◽  
Q Kong
Keyword(s):  
Electron Scattering ◽  
High Order ◽  
Intense Laser ◽  
Laser Beams ◽  
High Order Field

Electron Injection in Laser Plasma Accelerators by High-Order Field Ionization

2010 ◽  
Author(s):  
M. Chen ◽  
E. Esarey ◽  
C. G. R. Geddes ◽  
C. B. Schroeder ◽  
W. P. Leemans ◽  
...  
Keyword(s):  
Laser Plasma ◽  
Electron Injection ◽  
High Order ◽  
Field Ionization ◽  
Plasma Accelerators ◽  
High Order Field

A review of nanoimprint lithography for high-volume semiconductor device manufacturing

2017 ◽  
Vol 6 (3-4) ◽  
Author(s):  
Douglas J. Resnick ◽  
Jin Choi
Keyword(s):  
Nanoimprint Lithography ◽  
Semiconductor Device ◽  
High Volume ◽  
Temperature Correction ◽  
High Order ◽  
Distortion Correction ◽  
Imprint Lithography ◽  
Low Viscosity ◽  
The Status ◽  
The Cost

AbstractImprint lithography has been shown to be a promising technique for the replication of nanoscale features. Jet and flash imprint lithography (J-FIL) [jet and flash imprint lithography and J-FIL are trademarks of Molecular Imprints, Inc.] involves the field-by-field deposition and exposure of a low-viscosity resist deposited by jetting technology onto the substrate. The patterned mask is lowered into the fluid, which then quickly flows into the relief patterns in the mask by capillary action. After this filling step, the resist is cross-linked under UV radiation, and then the mask is removed, leaving a patterned resist on the substrate. There are many criteria that determine whether a particular technology is ready for wafer manufacturing. Included on the list are overlay, throughput, and defectivity. The most demanding devices now require an overlay of better than 4 nm, 3σ. Throughput for an imprint tool is generally targeted at 80 wafers/h. Defectivity and mask life play a significant role relative to meeting the cost of ownership (CoO) requirements in the production of semiconductor devices. The purpose of this paper is to report the status of throughput and defectivity work and to describe the progress made in addressing overlay for advanced devices. To address high-order corrections, a high-order distortion correction (HODC) system is introduced. The combination of applying magnification actuation to the mask and temperature correction to the wafer is described in detail. Examples are presented for the correction of K7, K11, and K17 distortions as well as distortions on actual device wafers.

High order field-to-field corrections for imaging and overlay to achieve sub 20-nm lithography requirements

2013 ◽  
Author(s):  
Jan Mulkens ◽  
Michael Kubis ◽  
Paul Hinnen ◽  
Roelof de Graaf ◽  
Hans van der Laan ◽  
...  
Keyword(s):  
High Order ◽  
20 Nm ◽  
High Order Field

Giant high-order field moments in metal–dielectric composites

1999 ◽  
Vol 266 (1-4) ◽  
pp. 115-122 ◽  
Author(s):  
Andrey K. Sarychev ◽  
Vladimir M. Shalaev
Keyword(s):  
High Order ◽  
High Order Field
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