High order field-to-field corrections for imaging and overlay to achieve sub 20-nm lithography requirements

Author(s):  
Jan Mulkens ◽  
Michael Kubis ◽  
Paul Hinnen ◽  
Roelof de Graaf ◽  
Hans van der Laan ◽  
...  
Keyword(s):  
20 Nm ◽  
Author(s):  
Boris Habets ◽  
Stefan Buhl ◽  
Wan-Soo Kim ◽  
Patrick Lomtscher ◽  
Holger Bald ◽  
...  

2001 ◽  
Vol 55 (4) ◽  
pp. 492-498
Author(s):  
J. X Wang ◽  
W Scheid ◽  
M Hoelss ◽  
Y. K Ho ◽  
Q Kong

2010 ◽  
Author(s):  
M. Chen ◽  
E. Esarey ◽  
C. G. R. Geddes ◽  
C. B. Schroeder ◽  
W. P. Leemans ◽  
...  

1999 ◽  
Vol 266 (1-4) ◽  
pp. 115-122 ◽  
Author(s):  
Andrey K. Sarychev ◽  
Vladimir M. Shalaev
Keyword(s):  

CrystEngComm ◽  
2017 ◽  
Vol 19 (9) ◽  
pp. 1304-1310 ◽  
Author(s):  
Yanting Zhang ◽  
Yingli Shen ◽  
Miao Liu ◽  
Yu Han ◽  
Xiulan Mo ◽  
...  

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