High order field-to-field corrections for imaging and overlay to achieve sub 20-nm lithography requirements
1991 ◽
Vol 18
(1)
◽
pp. 63-70
◽
Keyword(s):
Keyword(s):
2008 ◽
Vol 56
(8)
◽
pp. 2389-2397
◽
1999 ◽
Vol 266
(1-4)
◽
pp. 115-122
◽
Keyword(s):
2003 ◽
Vol 262
(1)
◽
pp. 101-106
◽