Terbium ion as RNA tag for slide-free histology with deep-ultraviolet excitation fluorescence (Conference Presentation)

2020 ◽  
Author(s):  
Yasuaki Kumamoto
Keyword(s):  
Ultraviolet Excitation ◽  
Deep Ultraviolet ◽  
Terbium Ion

scholarly journals Terbium ion as RNA tag for slide-free pathology with deep-ultraviolet excitation fluorescence

2019 ◽  
Vol 9 (1) ◽  
Author(s):  
Yasuaki Kumamoto ◽  
Tatsuya Matsumoto ◽  
Hideo Tanaka ◽  
Tetsuro Takamatsu
Keyword(s):  
Ultraviolet Excitation ◽  
Deep Ultraviolet ◽  
Terbium Ion

scholarly journals Correction to Plasmon-Enhanced Autofluorescence Imaging of Organelles in Label-Free Cells by Deep-Ultraviolet Excitation

2016 ◽  
Vol 88 (8) ◽  
pp. 4580-4580
Author(s):  
Masakazu Kikawada ◽  
Atsushi Ono ◽  
Wataru Inami ◽  
Yoshimasa Kawata
Keyword(s):  
Autofluorescence Imaging ◽  
Label Free ◽  
Ultraviolet Excitation ◽  
Free Cells ◽  
Deep Ultraviolet

Realizing Nondestructive Luminescence Readout in Photochromic Ceramics via Deep Ultraviolet Excitation for Optical Information Storage

2021 ◽  
Author(s):  
Zetian Yang ◽  
Jieqi Hu ◽  
Lisa I D J Martin ◽  
David Van der Heggen ◽  
Dirk Poelman
Keyword(s):  
High Density ◽  
Information Storage ◽  
Optical Information ◽  
Ultraviolet Excitation ◽  
Storage Media ◽  
Deep Ultraviolet ◽  
Optical Information Storage ◽  
Photochromic Materials

Photochromic materials exhibiting luminescence modulation behavior are regarded as promising for high-density optical information storage media. During the luminescence readout process however, many of these materials are subject to coloration...

Surface plasmon coupled fluorescence in deep-ultraviolet excitation by Kretschmann configuration

2013 ◽  
Vol 9 (1) ◽  
pp. 60-63 ◽  
Author(s):  
Atsushi Ono ◽  
Masakazu Kikawada ◽  
Wataru Inami ◽  
Yoshimasa Kawata
Keyword(s):  
Surface Plasmon ◽  
Kretschmann Configuration ◽  
Ultraviolet Excitation ◽  
Deep Ultraviolet

Plasmon-Enhanced Autofluorescence Imaging of Organelles in Label-Free Cells by Deep-Ultraviolet Excitation

2016 ◽  
Vol 88 (2) ◽  
pp. 1407-1411 ◽  
Author(s):  
Masakazu Kikawada ◽  
Atushi Ono ◽  
Wataru Inami ◽  
Yoshimasa Kawata
Keyword(s):  
Autofluorescence Imaging ◽  
Label Free ◽  
Ultraviolet Excitation ◽  
Free Cells ◽  
Deep Ultraviolet

Sub-50 fs excited state dynamics of 6-chloroguanine upon deep ultraviolet excitation

2016 ◽  
Vol 18 (20) ◽  
pp. 13874-13887 ◽  
Author(s):  
Sayan Mondal ◽  
Mrinalini Puranik
Keyword(s):  
Excited State ◽  
Electronic State ◽  
Resonance Raman ◽  
Raman Intensity ◽  
Intensity Analysis ◽  
Excited State Dynamics ◽  
Ultraviolet Excitation ◽  
Structural Distortions ◽  
Deep Ultraviolet

Instantaneous structural distortions of 6-chloroguanine in Bb electronic state from resonance Raman intensity analysis.

Novel organic, polymeric materials for electronics applications

2002 ◽  
Vol 722 ◽  
Author(s):  
Ram W. Sabnis ◽  
Mary J. Spencer ◽  
Douglas J. Guerrero
Keyword(s):  
Optical Density ◽  
Chemical Vapor ◽  
Polymeric Materials ◽  
Substantial Improvement ◽  
Polymeric Systems ◽  
Patterned Wafers ◽  
Visible Spectra ◽  
Potential Applications ◽  
Deep Ultraviolet ◽  
Deposited Films

AbstractNovel organic, polymeric materials and processes of depositing thin films on electronics substrates by chemical vapor deposition (CVD) have been developed and the lithographic behavior of photoresist coated over these CVD films at deep ultraviolet (DUV) wavelength has been evaluated. The specific monomers synthesized for DUV applications include [2.2](1,4)- naphthalenophane, [2.2](9,10)-anthracenophane and their derivatives which showed remarkable film uniformity on flat wafers and conformality over structured topography wafers, upon polymerization by CVD. The chemical, physical and optical properties of the deposited films have been characterized by measuring parameters such as thickness uniformity, solubility, conformality, adhesion to semiconductor substrates, ultraviolet-visible spectra, optical density, optical constants, defectivity, and resist compatibility. Scanning electron microscope (SEM) photos of cross-sectioned patterned wafers showed verticle profiles with no footing, standing waves or undercut. Resist profiles down to 0.10 νm dense lines and 0.09 νm isolated lines were achieved in initial tests. CVD coatings generated 96-100% conformal films, which is a substantial improvement over commercial spin-on polymeric systems. The light absorbing layers have high optical density at 248 nm and are therefore capable materials for DUV lithography applications. CVD is a potentially useful technology to extend lithography for sub-0.15 νm devices. These films have potential applications in microelectronics, optoelectronics and photonics.

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