Research on phase mask method-based phase-shifted fiber grating fabrication and sensing properties

Author(s):  
Danqing Yang ◽  
Yuxi Wang ◽  
Bowen Li ◽  
Xiaoya Song ◽  
Yinggang Liu
2017 ◽  
Vol 54 (2) ◽  
pp. 020603
Author(s):  
吕京生 Lü Jingsheng ◽  
宋志强 Song Zhiqiang ◽  
祁海峰 Qi Haifeng ◽  
倪家升 Ni Jiasheng ◽  
王昌 Wang Chang ◽  
...  

2007 ◽  
Vol 364-366 ◽  
pp. 719-723
Author(s):  
Quan Liu ◽  
Jian Hong Wu ◽  
Ling Ling Fang ◽  
Chao Ming Li

A fused silica phase mask with the period of 1069nm, and ruled area 50×50mm2 has been fabricated by a new technique, which combines holographic-ion beam etching and reactive ion beam etching. This involves several steps: coating of substrates with controlled thickness of photoresist, formation of a grating mask by holograph interference exposure and development, and finally transferring etching of this mask into the fused silica substrate to form a permanent phase mask. Experimental measurements have shown that the zero order diffraction efficiency is less than 4% and the plus and minus first-order diffraction efficiency is more than 35%. Theoretical analysis has shown that these phase masks can be used for fabricating UV written Fiber Bragg Gratings.


2014 ◽  
Author(s):  
Jing Wang ◽  
Ning Wang ◽  
Bin Shi ◽  
Qingmei Sui ◽  
Congsheng Guan ◽  
...  

1999 ◽  
Vol 17 (11) ◽  
pp. 2366-2370 ◽  
Author(s):  
Y. Qiu ◽  
Y. Sheng ◽  
C. Beaulieu

2019 ◽  
Vol 58 (06) ◽  
pp. 1
Author(s):  
Huanhuan Yan ◽  
Li Wang ◽  
Shufeng Li ◽  
Jin Wang ◽  
Huisong Zhang ◽  
...  

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