High-power KrF excimer laser with a solid state switch for microlithography

Author(s):  
Hakaru Mizoguchi ◽  
Noritoshi Ito ◽  
Hiroaki Nakarai ◽  
Yukio Kobayashi ◽  
Yasuo Itakura ◽  
...  
2001 ◽  
Author(s):  
Yusheng Shan ◽  
Naiyan Wang ◽  
Weiyi Ma ◽  
Dawei Yang ◽  
Xiaojun Wang ◽  
...  

2002 ◽  
Vol 20 (1) ◽  
pp. 123-127 ◽  
Author(s):  
YUSHENG SHAN ◽  
NAIYAN WANG ◽  
JINGLONG MA ◽  
WEIYI MA ◽  
DAWEI YANG ◽  
...  

A six-beam multiplexing master-oscillator-power-amplifier (MOPA) high power KrF excimer laser system has been built at CIAE for fundamental research on laser–plasma interaction. The MOPA system consists of front-end, two-stage KrF amplifiers (preamplifier and main amplifier) pumped by two-side electron beams, an optical angular multiplexing system, a synchronization trigger system, and a controlling-data acquisition system and some diagnostic systems. The total energy of the six-beam output from main amplifier on the target is 100 J/23 ns, the divergence of one beam is 0.2 mrad, the focal spot diameter is 220 μm, and the focal intensity on the target is 1013 W/cm2.


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