Rapid prototyping of 2D glass microfluidic devices based on femtosecond laser assisted selective etching process

2018 ◽  
Author(s):  
Chiwan Koo ◽  
Yeun-Ho Joung ◽  
Jiyeon Choi ◽  
Sung-il Kim ◽  
Jeongtae Kim
Keyword(s):  
Femtosecond Laser ◽  
Rapid Prototyping ◽  
Microfluidic Devices ◽  
Selective Etching ◽  
Etching Process

scholarly journals Rapid prototyping method for 3D PDMS microfluidic devices using a red femtosecond laser

2020 ◽  
Vol 12 (12) ◽  
pp. 168781402098271
Author(s):  
Mozafar Saadat ◽  
Marie Taylor ◽  
Arran Hughes ◽  
Amir M Hajiyavand
Keyword(s):  
Surface Roughness ◽  
Laminar Flow ◽  
Femtosecond Laser ◽  
Rapid Prototyping ◽  
Microfluidic Devices ◽  
Thermal Curing ◽  
Ramp Test ◽  
Mould Surface ◽  
Polished Metal ◽  
Pdms Device

A rapid prototyping technique is demonstrated which uses a red femtosecond laser to produce a metallic mould which is then directly used for the replica moulding of PDMS. The manufacturing process can be completed in less than 6 h making it a viable technique for testing new designs quickly. The technique is validated by creating a microfluidic device with channels of height and depth of 300 µm, with a ramp test structure where the height and width of the channels reduces to 100 µm to demonstrate the techniques 3D capabilities. The resulting PDMS device was easily removed from the metallic mould and closely replicated the shape aside the expected shrinkage during thermal curing. As the technique uses a single replica process, the surface roughness at the base of the channels corresponds to the un-ablated polished metal mould, resulting in a very low surface roughness of 0.361 nm. The ablated metallic mould surface corresponds to the top of the PDMS device, which is bonded to glass and does not affect the flow within the channels, reducing the need for optimisation of laser parameters. Finally, the device is validated by demonstrating laminar flow with the no-slip condition.

Rapid Prototyping of Glass Microfluidic Devices using Femtosecond Laser Pulses

2004 ◽  
Vol 820 ◽  
Author(s):  
Myung-Il Park ◽  
Jun Rye Choi ◽  
Mira Park ◽  
Dae Sik Choi ◽  
Sae Chae Jeoung ◽  
...  
Keyword(s):  
Femtosecond Laser ◽  
Rapid Prototyping ◽  
Laser Fluence ◽  
Femtosecond Laser Ablation ◽  
Microfluidic Devices ◽  
Soda Lime ◽  
Laser Pulses ◽  
Laser Micromachining ◽  
Femtosecond Laser Pulses ◽  
Mems Devices

AbstractLaser micromachining technology with 150 femtosecond pulses is developed to fabricate glass microfluidic devices. A short theoretical analysis of femtosecond laser ablation is reported to characterize the femtosecond laser micromachining. The ablated crater diameter is measured as a function of the number of laser pulses as well as laser fluence. Two different ablation regimes are observed and the transition between the regimes is dependent on both the laser fluence and the number of laser shots. Based on the ablation phenomena described, microfluidic devices are fabricated with commercially available soda lime glasses (76 mm × 26 mm × 1 mm, Knittel Glaser, Germany). In addition to a microchannel for microfluidics, the capillary as well as optical fiber for detecting is integrated on the same substrate. The substrate is successively packaged with a lid slide glass by a thermal direct bonding. The presented developments are suitable for fast turn-around design cycle and inexpensive procedure, which provide rapid prototyping of MEMS devices.

Femtosecond laser rapid prototyping of nanoshells and suspending components towards microfluidic devices

Lab on a Chip ◽  
2009 ◽  
Vol 9 (16) ◽  
pp. 2391 ◽  
Author(s):  
Dong Wu ◽  
Qi-Dai Chen ◽  
Li-Gang Niu ◽  
Jian-Nan Wang ◽  
Juan Wang ◽  
...  
Keyword(s):  
Femtosecond Laser ◽  
Rapid Prototyping ◽  
Microfluidic Devices

scholarly journals Safe and cost-effective rapid-prototyping of multilayer PMMA microfluidic devices

2016 ◽  
Vol 20 (12) ◽  
Author(s):  
Antonio Liga ◽  
Jonathan A. S. Morton ◽  
Maïwenn Kersaudy-Kerhoas
Keyword(s):  
Rapid Prototyping ◽  
Microfluidic Devices ◽  
Cost Effective

scholarly journals Selective etching of 10 MHz repetition rate fs-laser inscribed tracks in YAG

2021 ◽  
Vol 255 ◽  
pp. 10003
Author(s):  
Kore Hasse ◽  
Detlef Kip ◽  
Christian Kränkel
Keyword(s):  
Aspect Ratio ◽  
Repetition Rate ◽  
Laser System ◽  
Selective Etching ◽  
Etching Process ◽  
Acid Mixture ◽  
Laser Structuring ◽  
Order Of Magnitude ◽  
Fs Laser

We investigated fs-laser structuring of YAG crystals at high writing velocities up to 100 mm/s using a commercial 10 MHz fs-laser system supplied by Coherent Inc. and selective etching of these structures for fabrication of ultrahigh aspect ratio microchannels. Usage of a diluted acid mixture of 22% H3PO4 and 24% H2SO4 accelerated the etching process significantly to an etching parameter D of 11.2 μm2/s, which is three times higher than previously reported. Additionally, the selectivity of the etching process was increased by an order of magnitude.

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