Advances in stencil mask technology: control of distortion in ion-projection lithography masks

1995 ◽  
Author(s):  
John C. Wolfe ◽  
Alex R. Shimkunas ◽  
John Melngailis ◽  
Hans Loeschner ◽  
Robert D. Mohondro ◽  
...  
Keyword(s):  
Projection Lithography ◽  
Stencil Mask ◽  
Ion Projection Lithography ◽  
Technology Control

Ion Projection Lithography for Nano Patterning

1999 ◽  
Vol 584 ◽  
Author(s):  
A. Heuberger ◽  
W. Bruenger
Keyword(s):  
Continuous Improvement ◽  
Magnetic Films ◽  
Magnetic Storage ◽  
Flow Process ◽  
Patterned Media ◽  
Projection Lithography ◽  
Stencil Mask ◽  
Fraunhofer Institute ◽  
Ion Projection Lithography ◽  
Nano Patterning

AbstractAs a result of continuous improvement of the resist process, the experimental ion projector in the Fraunhofer Institute in Berlin (manufactured by Ion Microfabrication Systems, IMS, Vienna) has been able to print 75 nm lines and spaces into 180 nm thick standard DUV resist UV II HS without pattern collapse. A new wafer flow process for more reliable open stencil mask making was developed by IMS –Chips, Stuttgart (Germany), based on SOT wafers. Resistless direct surface modification by He and Xe ions has been tested on metallic and magnetic films in the Berlin projector. This method opens up a new possibility for the production of patterned media for future magnetic storage disks.

Analysis of stencil mask distortion in ion projection lithography

1997 ◽  
Vol 35 (1-4) ◽  
pp. 443-446 ◽  
Author(s):  
L. Didenko ◽  
J. Melngailis ◽  
H. Löschner ◽  
G. Stengl ◽  
A. Chalupka ◽  
...  
Keyword(s):  
Projection Lithography ◽  
Stencil Mask ◽  
Ion Projection Lithography

Ion projection lithography for resistless patterning of thin magnetic films

2000 ◽  
Vol 53 (1-4) ◽  
pp. 605-608 ◽  
Author(s):  
W.H. Bruenger ◽  
M. Torkler ◽  
C. Dzionk ◽  
B.D. Terris ◽  
L. Folks ◽  
...  
Keyword(s):  
Magnetic Films ◽  
Projection Lithography ◽  
Thin Magnetic Films ◽  
Ion Projection Lithography

Wafer stage assembly for ion projection lithography

2001 ◽  
Vol 57-58 ◽  
pp. 181-185 ◽  
Author(s):  
Christoph Damm ◽  
Thomas Peschel ◽  
Stephan Risse ◽  
Ulf C. Kirschstein
Keyword(s):  
Projection Lithography ◽  
Ion Projection Lithography

Resist technologies for ion projection lithography (IPL) stencil maskmaking

2000 ◽  
Author(s):  
Mathias Irmscher ◽  
Joerg Butschke ◽  
Klaus Elian ◽  
Bernd Hoefflinger ◽  
Karl Kragler ◽  
...  
Keyword(s):  
Projection Lithography ◽  
Ion Projection Lithography

Reference plate manufacturing process for the ion projection lithography pattern lock system

2001 ◽  
Vol 57-58 ◽  
pp. 213-218
Author(s):  
F. Letzkus ◽  
J. Butschke ◽  
M. Irmscher ◽  
C. Reuter ◽  
R. Springer ◽  
...  
Keyword(s):  
Manufacturing Process ◽  
Projection Lithography ◽  
Ion Projection Lithography ◽  
Reference Plate

Ion projection lithography in (in)organic resist layers

1986 ◽  
Vol 5 (1-4) ◽  
pp. 193-200 ◽  
Author(s):  
R. Fischer ◽  
E. Hammel ◽  
H. Löschner ◽  
G. Stengl ◽  
P. Wolf ◽  
...  
Keyword(s):  
Projection Lithography ◽  
Ion Projection Lithography
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