Study of Pd/Y based multilayers using high energy photoemission spectroscopy combined with x-ray standing waves

2017 ◽  
Author(s):  
M.-Y. Wu ◽  
V. Ilakovac ◽  
J.-M. André ◽  
K. Le Guen ◽  
A. Giglia ◽  
...  
Keyword(s):  
Standing Waves ◽  
High Energy ◽  
Photoemission Spectroscopy ◽  
X Ray

Growth of Transition Metal Films on AL(110) Surfaces

1995 ◽  
Vol 399 ◽  
Author(s):  
R.J. Smith ◽  
Adli A. Saleh ◽  
V. Shutthanandan ◽  
N.R. Shivaparan ◽  
V. Krasemann
Keyword(s):  
High Energy ◽  
Metal Films ◽  
Surface Strain ◽  
The Other ◽  
Photoemission Spectroscopy ◽  
Alloy Formation ◽  
Ion Scattering ◽  
X Ray ◽  
Photoelectron Diffraction ◽  
Ti Films

ABSTRACTThe growth of thin Pd, Ni, Fe and Ti films on Al(110) surfaces has been studied using high-energy ion scattering (HEIS), x-ray photoemission spectroscopy and photoelectron diffraction techniques. Of these four metals, only Ti grows as an epitaxial overlayer, while the other metals mix with the substrate to form surface alloys. In the HEIS experiments the backscattered ion yield from Al surface atoms is measured as a function of metal coverage on the Al surface. A decrease in the Al scattering is observed for Ti deposition while the other metals result in increased Al scattering, attributed to alloy formation. An explanation for the exceptional growth behavior of Ti on Al is provided using a model of surface strain associated with aluminide formation.

High-energy x-ray-excited valence-electron photoemission spectroscopy ofC2H2andC2D2

1988 ◽  
Vol 37 (12) ◽  
pp. 4730-4733 ◽  
Author(s):  
S. Svensson ◽  
E. Zdansky ◽  
U. Gelius ◽  
H. Ågren
Keyword(s):  
Valence Electron ◽  
High Energy ◽  
Photoemission Spectroscopy ◽  
X Ray ◽  
Electron Photoemission

SUPERSTRUCTURE FORMATION AND X-RAY PHOTOEMISSION PROPERTIES OF THE TlTiOPO4 SURFACE

2004 ◽  
Vol 11 (02) ◽  
pp. 191-198 ◽  
Author(s):  
V. V. ATUCHIN ◽  
L. D. POKROVSKY ◽  
V. G. KESLER ◽  
N. YU. MAKLAKOVA ◽  
V. I. VORONKOVA ◽  
...  
Keyword(s):  
Electronic Structure ◽  
Binding Energy ◽  
Electron Diffraction ◽  
Band Structure ◽  
High Energy ◽  
Photoemission Spectroscopy ◽  
High Energy Electron ◽  
Valence Band Structure ◽  
X Ray ◽  
Core Level Binding Energy

X-ray photoemission spectroscopy (XPS) measurements have been executed for TlTiOPO 4 to elucidate the general features in the electronic structure of the KTiOPO 4 family compounds. The peculiarities of the valence band structure have been discussed for the crystals. The persistence of core level binding energy differences O 1s–P 2p and O 1s–Ti 2p 3/2 has been detected in TlTiOPO 4 and KTiOPO 4, which relates well with the constancy of averaged P – O and Ti – O chemical bond lengths in this crystal family. The superstructure ordering of the TlTiOPO 4 surface subjected to polishing and annealing has been detected by reflectance high energy electron diffraction (RHEED). From comparison of surface crystallographic properties of TlTiOPO 4 and KTiOPO 4, the most typical superstructure indices have been revealed.

The Hard X-ray Photoemission Spectroscopy Facility at CLS: performance and first results

2015 ◽  
Vol 93 (1) ◽  
pp. 113-117 ◽  
Author(s):  
Qunfeng Xiao ◽  
Xiaoyu Cui ◽  
Yinbo Shi ◽  
Yongfeng Hu ◽  
Tsun-Kong Sham ◽  
...  
Keyword(s):  
High Energy ◽  
Photoemission Spectroscopy ◽  
Nondestructive Technique ◽  
Bulk Properties ◽  
X Ray ◽  
Probing Depth ◽  
First Results ◽  
Energy Version ◽  
Properties Of Materials ◽  
X Ray Absorption

Photoemission spectroscopy (PES) has been used widely to study the electronic structure of valence and core levels. However, conventional PES is surface-sensitive. To probe the interface and bulk properties of materials, hard X-ray photoemission spectroscopy (HXPES) has received increasing interest in the last decade, because of the deep probing ability of photoelectrons with higher kinetic energies (2–10 keV). Recently, a HXPES system was developed at the Canadian Light Source, using the high-energy version of a R4000 electron analyzer-based spectrometer connected to a medium-energy beamline, the soft X-ray microcharacterization beamline (SXRMB). Excellent performance of the beamline and the spectrometer is demonstrated herein using Au Fermi and 4f core lines; and the controlled probing depth of HXPES at SXRMB is demonstrated by tuning the photon energy (2–9 keV) in the study of a series of SiO2/SiC multilayer samples. Combined with the high-resolution X-ray absorption spectroscopy available at the SXRMB, the HXPES offers a powerful nondestructive technique for studying bulk properties of various materials.

Depth-resolved photoemission spectroscopy from surface and buried layers with soft X-ray standing waves

2000 ◽  
Vol 461 (1-3) ◽  
pp. L557-L564 ◽  
Author(s):  
S.-H. Yang ◽  
B.S. Mun ◽  
A.W. Kay ◽  
S.-K. Kim ◽  
J.B. Kortright ◽  
...  
Keyword(s):  
Standing Waves ◽  
Photoemission Spectroscopy ◽  
X Ray ◽  
Buried Layers

1sshake-up excitations in Ge andGeO2by high-energy x-ray photoemission spectroscopy

2000 ◽  
Vol 61 (3) ◽  
pp. 1871-1875 ◽  
Author(s):  
Vincenzo Formoso ◽  
Adriano Filipponi ◽  
Andrea Di Cicco ◽  
Gennaro Chiarello ◽  
Roberto Felici ◽  
...  
Keyword(s):  
High Energy ◽  
Photoemission Spectroscopy ◽  
X Ray

Effects of oxygen ion energy on the growth of CuO films by molecular beam epitaxy using mass-separated low-energy O+ beams

1994 ◽  
Vol 9 (5) ◽  
pp. 1280-1283 ◽  
Author(s):  
Ryusuke Kita ◽  
Kenichi Kawaguchi ◽  
Takashi Hase ◽  
Takeshi Koga ◽  
Rittaporn Itti ◽  
...  
Keyword(s):  
Kinetic Energy ◽  
High Energy ◽  
Photoemission Spectroscopy ◽  
Diffraction Reflection ◽  
X Ray Diffraction ◽  
Ion Energy ◽  
Rocking Curve ◽  
X Ray ◽  
Oxygen Ions ◽  
Oxygen Ion

We have studied the effects of the kinetic energy of mass-separated O+ beams on the growth of CuO thin films deposited on unheated MgO(001) and at 510 °C, in energy ranging from 10 to 200 eV by x-ray photoemission spectroscopy, x-ray diffraction, reflection high-energy electron diffraction, and scanning electron microscopy. The films deposited at 510 °C show a full width at the half maximum (FWHM) of 0.06°for the rocking curve through the (111) peak, regardless of the kinetic energy of oxygen ions. CuO has been epitaxially grown on MgO(001) without heating it in a vacuum of 4 × 10−7 Pa. The x-ray diffraction intensity of the CuO(111) increases with an increase in the kinetic energy of O+, and its FWHM approaches that of the CuO film grown at 510 °C. The surface morphology is improved for the films deposited on unheated substrates.

Depth-resolved photoemission spectroscopy with soft X-ray standing waves

2001 ◽  
Vol 114-116 ◽  
pp. 1089-1095 ◽  
Author(s):  
S.-H. Yang ◽  
B.S. Mun ◽  
A.W. Kay ◽  
S.-K. Kim ◽  
J.B. Kortright ◽  
...  
Keyword(s):  
Standing Waves ◽  
Photoemission Spectroscopy ◽  
X Ray
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