The next-generation ArF excimer laser for multiple-patterning immersion lithography with helium free operation

2016 ◽  
Author(s):  
Hirotaka Miyamoto ◽  
Takahito Kumazaki ◽  
Hiroaki Tsushima ◽  
Akihiko Kurosu ◽  
Takeshi Ohta ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Next Generation ◽  
Immersion Lithography ◽  
Arf Excimer Laser

Development of the next-generation ArF excimer laser with ultra-narrow stable spectral bandwidth for multiple patterning immersion lithography

2017 ◽  
Author(s):  
Hiroshi Furusato ◽  
Takahito Kumazaki ◽  
Takeshi Ohta ◽  
Hiroaki Tsushima ◽  
Akihiko Kurosu ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Spectral Bandwidth ◽  
Next Generation ◽  
Immersion Lithography ◽  
Arf Excimer Laser

Feasibility study of 6 kHz ArF excimer laser for 193 nm immersion lithography

2005 ◽  
Author(s):  
Tsukasa Hori ◽  
Takayuki Yabu ◽  
Takanobu Ishihara ◽  
Takayuki Watanabe ◽  
Osamu Wakabayashi ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Feasibility Study ◽  
Immersion Lithography ◽  
Arf Excimer Laser ◽  
193 Nm

High Resolution Displacement of Functional Groups onto Fluorocarbon Resin Surface by Using ArF Excimer Laser

1996 ◽  
Vol 451 ◽  
Author(s):  
T. Shimizu ◽  
M. Murahara
Keyword(s):  
Contact Angle ◽  
High Resolution ◽  
Laser Beam ◽  
Thin Layer ◽  
Functional Groups ◽  
Excimer Laser ◽  
Laser Fluence ◽  
Large Area ◽  
Three Solutions ◽  
Arf Excimer Laser

ABSTRACTA Fluorocarbon resin surface was selectively modified by irradiation with a ArF laser beam through a thin layer of NaAlO2, B(OH)3, or H2O solution to give a hydrophilic property. As a result, with low fluence, the surface was most effectively modified with the NaAlO2 solution among the three solutions. However, the contact angle in this case changed by 10 degrees as the fluence changed only 1mJ/cm2. When modifying a large area of the surface, high resolution displacement could not be achieved because the laser beam was not uniform in displacing functional groups. Thus, the laser fluence was successfully made uniform by homogenizing the laser beam; the functional groups were replaced on the fluorocarbon resin surface with high resolution, which was successfully modified to be hydrophilic by distributing the laser fluence uniformly.

Characterization of GaAs surfaces treated with phosphine gas photodecomposed by an ArF excimer laser

1998 ◽  
Vol 72 (12) ◽  
pp. 1472-1474 ◽  
Author(s):  
Takashi Sugino ◽  
Hideaki Ninomiya ◽  
Junji Shirafuji ◽  
Koichiro Matsuda
Keyword(s):  
Excimer Laser ◽  
Arf Excimer Laser

scholarly journals High Refractive Index Fluid for Next Generation ArF Immersion Lithography

2006 ◽  
Vol 19 (5) ◽  
pp. 641-646 ◽  
Author(s):  
Taiichi Furukawa ◽  
Katsuhiko Hieda ◽  
Yong Wang ◽  
Takashi Miyamatsu ◽  
Kinji Yamada ◽  
...  
Keyword(s):  
Refractive Index ◽  
High Refractive Index ◽  
Next Generation ◽  
Immersion Lithography

Transmission of corneal collagen during arf excimer laser ablation

1993 ◽  
Vol 13 (2) ◽  
pp. 204-210 ◽  
Author(s):  
M. N. Ediger ◽  
G. H. Pettit ◽  
R. P. Weiblinger ◽  
C. H. Chen
Keyword(s):  
Laser Ablation ◽  
Excimer Laser ◽  
Excimer Laser Ablation ◽  
Arf Excimer Laser ◽  
Corneal Collagen
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