Application of Mueller matrix spectroscopic ellipsometry to determine line edge roughness on photomasks

Mapping Intimacies ◽

10.1117/12.2030627 ◽

2013 ◽

Cited By ~ 3

Author(s):

A. Heinrich ◽

I. Dirnstorfer ◽

J. Bischoff ◽

U. Richter ◽

H. Ketelson ◽

...

Keyword(s):

Spectroscopic Ellipsometry ◽

Mueller Matrix ◽

Line Edge Roughness ◽

Edge Roughness

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Sensitivity analysis and line edge roughness determination of 28-nm pitch silicon fins using Mueller matrix spectroscopic ellipsometry-based optical critical dimension metrology

Journal of Micro/Nanolithography MEMS and MOEMS ◽

10.1117/1.jmm.14.3.031208 ◽

2015 ◽

Vol 14 (3) ◽

pp. 031208 ◽

Cited By ~ 11

Author(s):

Dhairya Dixit ◽

Samuel O’Mullane ◽

Sravan Sunkoju ◽

Abhishek Gottipati ◽

Erik R. Hosler ◽

...

Keyword(s):

Sensitivity Analysis ◽

Spectroscopic Ellipsometry ◽

Critical Dimension ◽

Mueller Matrix ◽

Line Edge Roughness ◽

Edge Roughness ◽

28 Nm

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Silicon fin line edge roughness determination and sensitivity analysis by Mueller matrix spectroscopic ellipsometry based scatterometry

10.1117/12.2185543 ◽

2015 ◽

Cited By ~ 1

Author(s):

Dhairya Dixit ◽

Samuel O'Mullane ◽

Sravan Sunkoju ◽

Erik R. Hosler ◽

Vimal Kamineni ◽

...

Keyword(s):

Sensitivity Analysis ◽

Spectroscopic Ellipsometry ◽

Mueller Matrix ◽

Line Edge Roughness ◽

Fin Line ◽

Edge Roughness

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Nondestructive analysis of lithographic patterns with natural line edge roughness from Mueller matrix ellipsometric data

Applied Surface Science ◽

10.1016/j.apsusc.2015.10.167 ◽

2016 ◽

Vol 388 ◽

pp. 524-530 ◽

Cited By ~ 6

Author(s):

Xiuguo Chen ◽

Yating Shi ◽

Hao Jiang ◽

Chuanwei Zhang ◽

Shiyuan Liu

Keyword(s):

Mueller Matrix ◽

Line Edge Roughness ◽

Nondestructive Analysis ◽

Edge Roughness

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Mueller matrix ellipsometry of artificial non-periodic line edge roughness in presence of finite numerical aperture

10.1117/12.879518 ◽

2011 ◽

Cited By ~ 3

Author(s):

Martin Foldyna ◽

Thomas A. Germer ◽

Brent C. Bergner

Keyword(s):

Numerical Aperture ◽

Mueller Matrix ◽

Line Edge Roughness ◽

Edge Roughness

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Characterization of Line-Edge Roughness in Cu/Low-kInterconnect Pattern

Japanese Journal of Applied Physics ◽

10.1143/jjap.47.2501 ◽

2008 ◽

Vol 47 (4) ◽

pp. 2501-2505 ◽

Cited By ~ 2

Author(s):

Atsuko Yamaguchi ◽

Daisuke Ryuzaki ◽

Ken-ichi Takeda ◽

Jiro Yamamoto ◽

Hiroki Kawada ◽

...

Keyword(s):

Line Edge Roughness ◽

Edge Roughness

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Study of the acid-diffusion effect on line edge roughness using the edge roughness evaluation method

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.1490392 ◽

2002 ◽

Vol 20 (4) ◽

pp. 1342 ◽

Cited By ~ 44

Author(s):

Masaki Yoshizawa ◽

Shigeru Moriya

Keyword(s):

Evaluation Method ◽

Line Edge Roughness ◽

Diffusion Effect ◽

Acid Diffusion ◽

Edge Roughness ◽

On Line ◽

Roughness Evaluation

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Interactions Between Line Edge Roughness and Random Dopant Fluctuation in Nonplanar Field-Effect Transistor Variability

IEEE Transactions on Electron Devices ◽

10.1109/ted.2013.2276072 ◽

2013 ◽

Vol 60 (10) ◽

pp. 3277-3284 ◽

Cited By ~ 26

Author(s):

Greg Leung ◽

Chi On Chui

Keyword(s):

Field Effect ◽

Field Effect Transistor ◽

Line Edge Roughness ◽

Random Dopant Fluctuation ◽

Edge Roughness ◽

Effect Transistor ◽

Random Dopant

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Application of cellular neural networks in the measurement of line-width and line edge roughness

10.1117/12.676727 ◽

2006 ◽

Author(s):

Hong-bo Li ◽

Xue-zheng Zhao ◽

Wei Chu ◽

Ning Li

Keyword(s):

Neural Networks ◽

Line Width ◽

Cellular Neural Networks ◽

Line Edge Roughness ◽

Edge Roughness

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Fabrication of low line edge roughness mold by SOG replica method

Digest of Papers. 2004 International Microprocesses and Nanotechnology Conference, 2004. ◽

10.1109/imnc.2004.245725 ◽

2004 ◽

Author(s):

Y. Kurashima ◽

H. Hiroshima ◽

M. Komuro ◽

N. Yamazaki ◽

J. Taniguchi ◽

...

Keyword(s):

Replica Method ◽

Line Edge Roughness ◽

Edge Roughness

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A new physical model and experimental measurements of copper interconnect resistivity considering size effects and line-edge roughness (LER)

2009 IEEE International Interconnect Technology Conference ◽

10.1109/iitc.2009.5090396 ◽

2009 ◽

Cited By ~ 24

Author(s):

Gerald Lopez ◽

Jeffrey Davis ◽

James Meindl

Keyword(s):

Physical Model ◽

Size Effects ◽

Experimental Measurements ◽

Line Edge Roughness ◽

Copper Interconnect ◽

Edge Roughness

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