Scaling law in acceleration test of extreme ultraviolet lithography projection optics mirror contamination

2005 ◽  
Vol 23 (6) ◽  
pp. 2848 ◽  
Author(s):  
Yoshio Gomei ◽  
Hiromitsu Takase ◽  
Takashi Aoki ◽  
Shuichi Matsunari ◽  
Shigeru Terashima ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Scaling Law ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Projection Optics ◽  
Acceleration Test

Inhibition of Contamination of Ru-Capped Multilayer Mirrors for Extreme Ultraviolet Lithography Projection Optics by Ethanol

2007 ◽  
Vol 46 (9B) ◽  
pp. 6155-6160 ◽  
Author(s):  
Yukinobu Kakutani ◽  
Masahito Niibe ◽  
Yoshio Gomei ◽  
Hiromitsu Takase ◽  
Shigeru Terashima ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Multilayer Mirrors ◽  
Ultraviolet Lithography ◽  
Projection Optics

Multilayer coating of 10X projection optics for extreme ultraviolet lithography

1999 ◽  
Author(s):  
Claude Montcalm ◽  
Eberhard A. Spiller ◽  
Marco Wedowski ◽  
Eric M. Gullikson ◽  
James A. Folta
Keyword(s):  
Extreme Ultraviolet ◽  
Multilayer Coating ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Projection Optics

Shearing Interferometry for at Wavelength Wavefront Measurement of Extreme-Ultraviolet Lithography Projection Optics

2003 ◽  
Vol 42 (Part 1, No. 9A) ◽  
pp. 5844-5847 ◽  
Author(s):  
Yucong Zhu ◽  
Katsumi Sugisaki ◽  
Katsuhiko Murakami ◽  
Kazuya Ota ◽  
Hiroyuki Kondo ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Shearing Interferometry ◽  
Wavefront Measurement ◽  
Projection Optics
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