Mask 3D effects and compensation for high NA EUV lithography

2013 ◽  
Author(s):  
Sudharshanan Raghunathan ◽  
Greg McIntyre ◽  
Germain Fenger ◽  
Obert Wood
Keyword(s):  
Euv Lithography ◽  
3D Effects

Alternative absorber materials for mitigation of mask 3D effects in high NA EUV lithography

2018 ◽  
Author(s):  
Claire van Lare ◽  
Frank Timmermans ◽  
Jo Finders ◽  
John McNamara ◽  
Eelco van Setten
Keyword(s):  
Euv Lithography ◽  
3D Effects

Status of the liquid-xenon-jet laser-plasma source for EUV lithography

2002 ◽  
Author(s):  
Bjoern A. M. Hansson ◽  
Lars Rymell ◽  
Magnus Berglund ◽  
Oscar E. Hemberg ◽  
Emmanuelle Janin ◽  
...  
Keyword(s):  
Laser Plasma ◽  
Plasma Source ◽  
Liquid Xenon ◽  
Euv Lithography

Toward the In Situ Remediation of Carbon Deposition on Ru-Capped Multilayer Mirrors Intended for EUV Lithography:  Exploiting the Electron-Induced Chemistry

2007 ◽  
Vol 111 (33) ◽  
pp. 12165-12168 ◽  
Author(s):  
David J. Davis ◽  
Georgios Kyriakou ◽  
Robert B. Grant ◽  
Mintcho S. Tikhov ◽  
Richard M. Lambert
Keyword(s):  
Carbon Deposition ◽  
In Situ Remediation ◽  
Multilayer Mirrors ◽  
Euv Lithography
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