Pupil wavefront manipulation to compensate for mask topography effects in optical nanolithography

2013 ◽  
Author(s):  
Monica Kempsell Sears ◽  
Bruce W. Smith
Keyword(s):  
Optical Nanolithography

Optical Nanolithography

2020 ◽  
pp. 41-140
Author(s):  
Bruce W. Smith
Keyword(s):  
Optical Nanolithography

scholarly journals Parallel optical nanolithography using nanoscale bowtie aperture array

2010 ◽  
Vol 18 (7) ◽  
pp. 7369 ◽  
Author(s):  
Sreemanth M.V. Uppuluri ◽  
Edward C. Kinzel ◽  
Yan Li ◽  
Xianfan Xu
Keyword(s):  
Aperture Array ◽  
Optical Nanolithography ◽  
Bowtie Aperture

Practical Aspects of Off-Axis Illumination in Optical Nanolithography

2004 ◽  
Vol 33 (4) ◽  
pp. 209-219
Author(s):  
V. V. Ivin ◽  
T. M. Makhviladze ◽  
K. A. Valiev
Keyword(s):  
Optical Nanolithography

scholarly journals Optical nanolithography with λ/15 resolution using bowtie aperture array

2014 ◽  
Vol 117 (1) ◽  
pp. 307-311 ◽  
Author(s):  
Xiaolei Wen ◽  
Luis M. Traverso ◽  
Pornsak Srisungsitthisunti ◽  
Xianfan Xu ◽  
Euclid E. Moon
Keyword(s):  
Aperture Array ◽  
Optical Nanolithography ◽  
Bowtie Aperture

Characterization of Uniformity and Reproducibility of Photoresist Nanomasks Fabricated by Near-Field Scanning Optical Nanolithography

2006 ◽  
Vol 6 (11) ◽  
pp. 3647-3651 ◽  
Author(s):  
Sangjin Kwon ◽  
Youngmo Jeong ◽  
Sungho Jeong
Keyword(s):  
Silicon Substrate ◽  
Near Field ◽  
Pattern Transfer ◽  
Contact Mode ◽  
Positive Photoresist ◽  
Atomic Force ◽  
Optical Nanolithography ◽  
Nanochannel Array ◽  
Near Field Scanning

The uniformity and reproducibility of the photoresist nanopatterns fabricated using near-field scanning optical nanolithography (NSOL) are investigated. The nanopatterns could be used as nanomasks for pattern transfer on a silicon wafer. In the NSOL process, uniform patterning with high reproducibility is essential for reliable transfer of the mask patterns on a silicon substrate. Using an aperture type cantilever nanoprobe operated at contact mode and a positive photoresist, various nanopatterns are produced on thin photoresist layer coated on the silicon substrate. The size and shape variations of thereby produced patterns are investigated using atomic force microscope to determine their uniformity and reproducibility. It is demonstrated that the NSOL-produced photoresist nanomasks can be successfully applied for silicon pattern transfer by fabricating a silicon nanochannel array.

scholarly journals Contact optical nanolithography using nanoscale C-shaped apertures

2006 ◽  
Vol 14 (21) ◽  
pp. 9902 ◽  
Author(s):  
Liang Wang ◽  
Eric X. Jin ◽  
Sreemanth M. Uppuluri ◽  
Xianfan Xu
Keyword(s):  
Optical Nanolithography
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