Evaluation of image-placement distortion contributors of the EL-3+ electron-beam lithography system in x-ray mask fabrication

1994 ◽  
Author(s):  
Denise M. Puisto ◽  
Mark Lawliss
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
X Ray ◽  
Lithography System ◽  
Mask Fabrication

High resolution x-ray mask fabrication by a 100 keV electron-beam lithography system

2004 ◽  
Vol 14 (5) ◽  
pp. 722-726 ◽  
Author(s):  
Lin Wang ◽  
Yohannes M Desta ◽  
Rainer K Fettig ◽  
Jost Goettert ◽  
Herbert Hein ◽  
...  
Keyword(s):  
Electron Beam ◽  
High Resolution ◽  
Electron Beam Lithography ◽  
X Ray ◽  
Lithography System ◽  
Mask Fabrication

High precision mask fabrication for deep X-ray lithography using 40-kV shaped electron beam lithography

2001 ◽  
Vol 57-58 ◽  
pp. 761-767 ◽  
Author(s):  
Andreas Schmidt ◽  
Gerhard Himmelsbach ◽  
Regina Lüttge ◽  
Dieter Adam ◽  
Falk Hoke ◽  
...  
Keyword(s):  
Electron Beam ◽  
High Precision ◽  
Electron Beam Lithography ◽  
X Ray ◽  
Mask Fabrication

A study of proximity effects at high electron-beam voltages for x-ray mask fabrication part 1: Additive mask processes

1991 ◽  
Vol 13 (1-4) ◽  
pp. 165-172 ◽  
Author(s):  
M.G. Rosenfield ◽  
S.A. Rishton ◽  
D.P. Kern ◽  
D.E. Seeger ◽  
C.A. Whiting
Keyword(s):  
Electron Beam ◽  
Proximity Effects ◽  
High Electron ◽  
X Ray ◽  
Mask Fabrication

Design of soft x-ray varied-line-spacing grating based on electron beam lithography-near field lithography

2016 ◽  
Author(s):  
Dakui Lin ◽  
Huoyao Chen ◽  
Stefanie Kroker ◽  
Thomas Käsebier ◽  
Zhengkun Liu ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Near Field ◽  
X Ray ◽  
Line Spacing
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