Patterning tungsten films with an electron beam lithography system at 50 keV for x-ray mask applications

1991 ◽  
Vol 9 (6) ◽  
pp. 3292 ◽  
Author(s):  
K. W. Rhee
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
X Ray ◽  
Lithography System

High resolution x-ray mask fabrication by a 100 keV electron-beam lithography system

2004 ◽  
Vol 14 (5) ◽  
pp. 722-726 ◽  
Author(s):  
Lin Wang ◽  
Yohannes M Desta ◽  
Rainer K Fettig ◽  
Jost Goettert ◽  
Herbert Hein ◽  
...  
Keyword(s):  
Electron Beam ◽  
High Resolution ◽  
Electron Beam Lithography ◽  
X Ray ◽  
Lithography System ◽  
Mask Fabrication

Design of soft x-ray varied-line-spacing grating based on electron beam lithography-near field lithography

2016 ◽  
Author(s):  
Dakui Lin ◽  
Huoyao Chen ◽  
Stefanie Kroker ◽  
Thomas Käsebier ◽  
Zhengkun Liu ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Near Field ◽  
X Ray ◽  
Line Spacing

Fast Electron Beam Lithography System with 1024 Beams Individually Controlled by Blanking Aperture Array

1993 ◽  
Vol 32 (Part 1, No. 12B) ◽  
pp. 6012-6017 ◽  
Author(s):  
Hiroshi Yasuda ◽  
Soichiro Arai ◽  
Jun-ichi Kai ◽  
Yoshihisa Ooae ◽  
Tomohiko Abe ◽  
...  
Keyword(s):  
Electron Beam ◽  
Fast Electron ◽  
Electron Beam Lithography ◽  
Fast Electron Beam ◽  
Aperture Array ◽  
Lithography System
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