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Electron-beam lithography optimization for 0.25-um x-ray mask making
Mapping Intimacies
◽
10.1117/12.167282
◽
1994
◽
Author(s):
Denise M. Puisto
Keyword(s):
Electron Beam
◽
Electron Beam Lithography
◽
X Ray
◽
Mask Making
Download Full-text
Related Documents
Cited By
References
Multiple-pass writing optimization for proximity x-ray mask-making using electron-beam lithography
Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena
◽
10.1116/1.589049
◽
1996
◽
Vol 14
(6)
◽
pp. 4341
◽
Cited By ~ 3
Author(s):
Denise M. Puisto
Keyword(s):
Electron Beam
◽
Electron Beam Lithography
◽
X Ray
◽
Mask Making
◽
Multiple Pass
Download Full-text
X-ray zone plates fabricated using electron beam lithography and reactive ion etching
Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena
◽
10.1116/1.583242
◽
1985
◽
Vol 3
(1)
◽
pp. 265
◽
Cited By ~ 6
Author(s):
H. Aritome
Keyword(s):
Electron Beam
◽
Electron Beam Lithography
◽
Reactive Ion Etching
◽
Ion Etching
◽
X Ray
◽
Zone Plates
Download Full-text
Predicting in-plane distortion from electron-beam lithography on x-ray mask membranes
Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena
◽
10.1116/1.589042
◽
1996
◽
Vol 14
(6)
◽
pp. 4308
◽
Cited By ~ 4
Author(s):
D. L. Laird
Keyword(s):
Electron Beam
◽
Electron Beam Lithography
◽
X Ray
Download Full-text
Design of soft x-ray varied-line-spacing grating based on electron beam lithography-near field lithography
10.1117/12.2246356
◽
2016
◽
Author(s):
Dakui Lin
◽
Huoyao Chen
◽
Stefanie Kroker
◽
Thomas Käsebier
◽
Zhengkun Liu
◽
...
Keyword(s):
Electron Beam
◽
Electron Beam Lithography
◽
Near Field
◽
X Ray
◽
Line Spacing
Download Full-text
Fabrication of high aspect ratio subwavelength gratings based on X-ray lithography and electron beam lithography
Optics & Laser Technology
◽
10.1016/j.optlastec.2011.11.051
◽
2012
◽
Vol 44
(6)
◽
pp. 1649-1653
◽
Cited By ~ 12
Author(s):
Chenchen Luo
◽
Yigui Li
◽
Sugiyama Susumu
Keyword(s):
Electron Beam
◽
Aspect Ratio
◽
High Aspect Ratio
◽
Electron Beam Lithography
◽
X Ray
◽
Subwavelength Gratings
Download Full-text
Electron-beam lithography simulation for mask making: VI. Comparison of 10- and 50-kV GHOST proximity effect correction
10.1117/12.438354
◽
2001
◽
Cited By ~ 1
Author(s):
Chris A. Mack
Keyword(s):
Electron Beam
◽
Proximity Effect
◽
Electron Beam Lithography
◽
Lithography Simulation
◽
Mask Making
◽
Proximity Effect Correction
Download Full-text
Imaging zone plates for x-ray microscopy fabricated by electron-beam lithography
Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena
◽
10.1116/1.583989
◽
1988
◽
Vol 6
(1)
◽
pp. 323
◽
Cited By ~ 2
Author(s):
P. Unger
Keyword(s):
Electron Beam
◽
Electron Beam Lithography
◽
X Ray
◽
Zone Plates
Download Full-text
Fabrication of X-Ray Masks Using the Silicon Direct Write Electron-Beam Lithography Process and Complementary Electron-Sensitive Resists
Japanese Journal of Applied Physics
◽
10.1143/jjap.41.4122
◽
2002
◽
Vol 41
(Part 1, No. 6B)
◽
pp. 4122-4126
Author(s):
Eric Lavallée
◽
Jacques Beauvais
◽
Dominique Drouin
◽
Mélanie Cloutier
◽
Pan Yang
◽
...
Keyword(s):
Electron Beam
◽
Electron Beam Lithography
◽
Direct Write
◽
X Ray
◽
Lithography Process
Download Full-text
Fabrication of 200 nm period x-ray transmission gratings using electron beam lithography
10.1117/12.758100
◽
2007
◽
Author(s):
Xiaoli Zhu
◽
Changqing Xie
◽
Tianchun Ye
◽
Min Zhao
◽
Jie Ma
◽
...
Keyword(s):
Electron Beam
◽
Electron Beam Lithography
◽
X Ray
Download Full-text
Patterning tungsten films with an electron beam lithography system at 50 keV for x-ray mask applications
Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena
◽
10.1116/1.585306
◽
1991
◽
Vol 9
(6)
◽
pp. 3292
◽
Cited By ~ 3
Author(s):
K. W. Rhee
Keyword(s):
Electron Beam
◽
Electron Beam Lithography
◽
X Ray
◽
Lithography System
Download Full-text
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