Multiple-pass writing optimization for proximity x-ray mask-making using electron-beam lithography

1996 ◽  
Vol 14 (6) ◽  
pp. 4341 ◽  
Author(s):  
Denise M. Puisto
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
X Ray ◽  
Mask Making ◽  
Multiple Pass

Design of soft x-ray varied-line-spacing grating based on electron beam lithography-near field lithography

2016 ◽  
Author(s):  
Dakui Lin ◽  
Huoyao Chen ◽  
Stefanie Kroker ◽  
Thomas Käsebier ◽  
Zhengkun Liu ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Near Field ◽  
X Ray ◽  
Line Spacing

Fabrication of X-Ray Masks Using the Silicon Direct Write Electron-Beam Lithography Process and Complementary Electron-Sensitive Resists

2002 ◽  
Vol 41 (Part 1, No. 6B) ◽  
pp. 4122-4126
Author(s):  
Eric Lavallée ◽  
Jacques Beauvais ◽  
Dominique Drouin ◽  
Mélanie Cloutier ◽  
Pan Yang ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Direct Write ◽  
X Ray ◽  
Lithography Process

Fabrication of 200 nm period x-ray transmission gratings using electron beam lithography

2007 ◽  
Author(s):  
Xiaoli Zhu ◽  
Changqing Xie ◽  
Tianchun Ye ◽  
Min Zhao ◽  
Jie Ma ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
X Ray
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