Exposure dose dependence on line edge roughness of a latent image in electron beam/extreme ultraviolet lithographies studied by Monte Carlo technique

2007 ◽  
Vol 6 (4) ◽  
pp. 043004 ◽  
Author(s):  
Akinori Saeki
Keyword(s):  
Monte Carlo ◽  
Electron Beam ◽  
Extreme Ultraviolet ◽  
Dose Dependence ◽  
Exposure Dose ◽  
Monte Carlo Technique ◽  
Line Edge Roughness ◽  
Latent Image ◽  
Edge Roughness ◽  
On Line

Impact of Latent Image Quality on Line Edge Roughness in Electron Beam Lithography

2004 ◽  
Vol 43 (6B) ◽  
pp. 3739-3743 ◽  
Author(s):  
Masaki Yoshizawa ◽  
Shigeru Moriya ◽  
Hiroyuki Nakano ◽  
Yuichi Shirai ◽  
Tatsuo Morita ◽  
...  
Keyword(s):  
Electron Beam ◽  
Image Quality ◽  
Electron Beam Lithography ◽  
Line Edge Roughness ◽  
Latent Image ◽  
Edge Roughness ◽  
On Line

Simulation of amine concentration dependence on line edge roughness after development in electron beam lithography

2008 ◽  
Vol 104 (2) ◽  
pp. 024303 ◽  
Author(s):  
Akinori Saeki ◽  
Takahiro Kozawa ◽  
Seiichi Tagawa ◽  
Heidi B. Cao ◽  
Hai Deng ◽  
...  
Keyword(s):  
Electron Beam ◽  
Concentration Dependence ◽  
Electron Beam Lithography ◽  
Line Edge Roughness ◽  
Amine Concentration ◽  
Edge Roughness ◽  
On Line
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