Impact of polarization on an attenuated phase shift mask with ArF hyper-numerical aperture lithography

2006 ◽  
Vol 5 (4) ◽  
pp. 043001 ◽  
Author(s):  
Takashi Sato
Keyword(s):  
Phase Shift ◽  
Numerical Aperture ◽  
Phase Shift Mask

Optimal phase shift and reflectance for high numerical aperture EUV phase shift mask

2021 ◽  
Author(s):  
Inhwa Kang ◽  
Jang-Gun Park ◽  
Minwoo Kim ◽  
Jun-Hyeong Lee ◽  
Hye-Keun Oh
Keyword(s):  
Phase Shift ◽  
Numerical Aperture ◽  
High Numerical Aperture ◽  
Phase Shift Mask

Characterization of 45 nm Attenuated Phase Shift Mask Lithography with a Hyper Numerical Aperture ArF Tool

2006 ◽  
Vol 45 (6B) ◽  
pp. 5391-5395 ◽  
Author(s):  
Takashi Sato ◽  
Ayako Endo ◽  
Akiko Mimotogi ◽  
Shoji Mimotogi ◽  
Kazuya Sato ◽  
...  
Keyword(s):  
Phase Shift ◽  
Numerical Aperture ◽  
Phase Shift Mask

Monte-Carlo-Based Automatic Design of Chromeless Phase Shift Mask

2004 ◽  
Vol 43 (2) ◽  
pp. 514-517
Author(s):  
Jai-Cheol Lee ◽  
Yong-Ho Oh ◽  
Sungwoo Lim ◽  
Chun Soo Go ◽  
Sung Su Roh
Keyword(s):  
Monte Carlo ◽  
Phase Shift ◽  
Automatic Design ◽  
Phase Shift Mask

Preliminary study of 65 nm node alternating phase-shift mask fabrication

2002 ◽  
Author(s):  
Kouji Hosono ◽  
Naoyuki Ishiwata ◽  
Satoru Asai ◽  
Hiroshi Maruyama ◽  
Yutaka Miyahara ◽  
...  
Keyword(s):  
Phase Shift ◽  
Preliminary Study ◽  
Phase Shift Mask ◽  
Alternating Phase Shift Mask ◽  
Mask Fabrication

Application of alternating phase shift mask to device fabrication

1995 ◽  
Author(s):  
Sunggi Kim ◽  
Sang-Gyun Woo ◽  
Woo-Sung Han ◽  
Young-Bum Koh ◽  
Moon-Yong Lee
Keyword(s):  
Phase Shift ◽  
Device Fabrication ◽  
Phase Shift Mask ◽  
Alternating Phase Shift Mask
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