Physical and chemical vapor deposition methods applied to all-inorganic metal halide perovskites

2020 ◽  
Vol 38 (6) ◽  
pp. 060803
Author(s):  
Sara Bonomi ◽  
Lorenzo Malavasi
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Metal Halide ◽  
Halide Perovskites ◽  
Physical And Chemical

Prediction of chemical vapor deposition rates on monofilaments and its implications for fiber properties

1992 ◽  
Vol 7 (11) ◽  
pp. 3023-3031
Author(s):  
S.A. Gökoĝlu ◽  
M. Kuczmarski ◽  
L.C. Veitch
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Axisymmetric Flow ◽  
Small Diameter ◽  
Chemical Vapor ◽  
Chemical Kinetic ◽  
Deposition Rates ◽  
Fiber Properties ◽  
Hydrogen Carrier ◽  
Physical And Chemical

Deposition rates are predicted in a cylindrical upflow reactor designed for chemical vapor deposition (CVD) on monofilaments. Deposition of silicon from silane in a hydrogen carrier gas is chosen as a relevant example. The effects of gas and surface chemistry are studied in a two-dimensional axisymmetric flow field for this chemically well-studied system. Model predictions are compared to experimental CVD rate measurements. The differences in some physical and chemical phenomena between such small diameter (∼150 μm) fiber substrates and other typical CVD substrates are highlighted. The influence of the Soret mass transport mechanism is determined to be extraordinarily significant. The difficulties associated with the accurate measurement and control of the fiber temperature are discussed. Model prediction sensitivities are investigated with respect to fiber temperatures, fiber radii, Soret transport, and chemical kinetic parameters. The implications of the predicted instantaneous rates are discussed relative to the desired fiber properties for both batch and continuous processes.

Nanostructured carbon generated by chemical vapor deposition from acetylene on surfaces pretreated by a combination of physical and chemical methods

2000 ◽  
Vol 15 (10) ◽  
pp. 2087-2090 ◽  
Author(s):  
Andrea Siska ◽  
Zoltán Kónya ◽  
Klára Hernádi ◽  
Imre Kiricsi ◽  
Krisztián Kordás ◽  
...  
Keyword(s):  
Carbon Nanotubes ◽  
Chemical Vapor Deposition ◽  
Laser Irradiation ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Catalytic Decomposition ◽  
Catalyst System ◽  
Cobalt Acetate ◽  
Acetate Solution ◽  
Physical And Chemical

Chemical vapor deposition of carbon nanotubes by catalytic decomposition of acetylene on V2O5 microtube crystals is presented. The catalyst was prepared by laser irradiation of vanadium sheets and treated with cobalt acetate solution. The carbon deposits generated on this novel type of catalyst were characterized by transmission electron microscopy measurements. Both carbon nanofibers and carbon nanotubes were found to be formed. This catalyst system, generated by the combined laser irradiation and chemical impregnation methods, is a new and promising way to study the differences in the mechanism of the generation of nanostructures.

scholarly journals Evolution of Surface Roughness During CVD Growth

1996 ◽  
Vol 440 ◽  
Author(s):  
E. Chason ◽  
T.M. Mayer ◽  
D.P. Adams ◽  
H. Huang ◽  
T. Diaz De La Rubia ◽  
...  
Keyword(s):  
Surface Roughness ◽  
Monte Carlo ◽  
Chemical Vapor Deposition ◽  
Monte Carlo Simulations ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Molecular Precursors ◽  
Cvd Growth ◽  
Physical And Chemical ◽  
Kinetics Of

AbstractMonte Carlo simulations of physical and chemical vapor deposition are used to study roughening kinetics of films that grow by nucleation and coalescence of clusters. The effects of interlayer transport, preferential dissociation of molecular precursors and energetic differences between the clusters and the substrate are examined.

Synchrotron Radiation X-Ray Absorption and Optical Studies of Cubic SiC Films Grown on Si by Chemical Vapor Deposition

2011 ◽  
Vol 306-307 ◽  
pp. 167-170
Author(s):  
Yu Li Tu ◽  
Yan Hao Huang ◽  
Ling Min Kong ◽  
Kung Yen Lee ◽  
Ling Yun Jang ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Synchrotron Radiation ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Peak Frequency ◽  
Atomic Scale ◽  
X Ray ◽  
Physical And Chemical ◽  
X Ray Absorption ◽  
Sic Films

Synchrotron radiation extended X-ray absorption fine structure and Raman scattering were used to characterize a series of 3C-SiC films grown on Si (100) by chemical vapor deposition. EXAFS can probe the physical and chemical structure of matters at an atomic scale and Raman parameters such as intensity, width, peak frequency and polarization provide fruitful information on the crystal quality and properties of these film materials.

Impact of Hf Metal Predeposition on the Properties of HfO2Grown by Physical and Chemical Vapor Deposition

2003 ◽  
Vol 42 (Part 1, No. 4B) ◽  
pp. 1835-1839 ◽  
Author(s):  
Kazuhiko Yamamoto ◽  
Shigenori Hayashi ◽  
Masaaki Niwa ◽  
Masayuki Asai ◽  
Sadayoshi Horii ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Physical And Chemical
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