Low-energy high-flux ion bombardment-induced interfacial mixing during Al2O3 plasma-enhanced atomic layer deposition

2020 ◽  
Vol 38 (5) ◽  
pp. 052407
Author(s):  
Masaki Hirayama ◽  
Shigetoshi Sugawa
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Ion Bombardment ◽  
Low Energy ◽  
High Flux ◽  
Layer Deposition ◽  
Interfacial Mixing

Ion Bombardment during Plasma-Assisted Atomic Layer Deposition

2013 ◽  
Vol 50 (13) ◽  
pp. 23-34 ◽  
Author(s):  
H. B. Profijt ◽  
W. M. M. Kessels
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Ion Bombardment ◽  
Layer Deposition

Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistance

2021 ◽  
Vol 39 (3) ◽  
pp. 032416
Author(s):  
Taguhi Yeghoyan ◽  
Vincent Pesce ◽  
Moustapha Jaffal ◽  
Gauthier Lefevre ◽  
Rémy Gassilloud ◽  
...  
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Ion Bombardment ◽  
Selective Deposition ◽  
Layer Deposition

Stabilizing a high-temperature electrochemical silver-carbonate CO2 capture membrane by atomic layer deposition of a ZrO2 overcoat

2016 ◽  
Vol 52 (63) ◽  
pp. 9817-9820 ◽  
Author(s):  
Peng Zhang ◽  
Jingjing Tong ◽  
Youngseok Jee ◽  
Kevin Huang
Keyword(s):  
High Temperature ◽  
Atomic Layer Deposition ◽  
High Temperatures ◽  
Co2 Capture ◽  
High Selectivity ◽  
Atomic Layer ◽  
Dual Phase ◽  
High Flux ◽  
Silver Carbonate ◽  
Layer Deposition

A high-selectivity and high-flux electrochemical silver-carbonate dual-phase membrane was coated with a nanoscaled ZrO2 layer by atomic layer deposition (ALD) for stable CO2 capture at high temperatures (≥800 °C).

scholarly journals Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate

2020 ◽  
Vol 117 (3) ◽  
pp. 031602 ◽  
Author(s):  
K. Arts ◽  
J. H. Deijkers ◽  
T. Faraz ◽  
R. L. Puurunen ◽  
W. M. M. (Erwin) Kessels ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Etch Rate ◽  
Atomic Layer ◽  
Low Energy ◽  
Layer Deposition ◽  
Wet Etch ◽  
Low Energy Ions

Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect

2020 ◽  
Vol 128 (6) ◽  
pp. 065301 ◽  
Author(s):  
Igor Krylov ◽  
Valentina Korchnoy ◽  
Xianbin Xu ◽  
Kamira Weinfeld ◽  
Eilam Yalon ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Structural Properties ◽  
Atomic Layer ◽  
Ion Bombardment ◽  
Layer Deposition
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