Ultrahigh aspect ratio etching of silicon in SF6-O2 plasma: The clear-oxidize-remove-etch (CORE) sequence and chromium mask
2020 ◽
Vol 38
(5)
◽
pp. 053002
2010 ◽
Vol 28
(4)
◽
pp. 862-868
◽
2020 ◽
Vol 38
(4)
◽
pp. 043004
Keyword(s):
2010 ◽
Vol 28
(4)
◽
pp. 854-861
◽
Keyword(s):
2017 ◽
Vol 5
(3)
◽
pp. 713
Keyword(s):
2013 ◽
Vol 23
(6)
◽
pp. 206-207