Properties of secondary particles for ion beam sputtering of silicon using low-energy oxygen ions

Kyunghwan Oh; Dmitry Kalanov; André Anders; Carsten Bundesmann

doi:10.1116/6.0000037

Properties of secondary particles for ion beam sputtering of silicon using low-energy oxygen ions

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/6.0000037 ◽

2020 ◽

Vol 38 (3) ◽

pp. 033011 ◽

Cited By ~ 2

Author(s):

Kyunghwan Oh ◽

Dmitry Kalanov ◽

André Anders ◽

Carsten Bundesmann

Keyword(s):

Ion Beam ◽

Low Energy ◽

Ion Beam Sputtering ◽

Oxygen Ions ◽

Secondary Particles ◽

Beam Sputtering

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Properties of secondary particles for the reactive ion beam sputtering of Ti and TiO2 using oxygen ions

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.5142911 ◽

2020 ◽

Vol 38 (3) ◽

pp. 033403 ◽

Cited By ~ 2

Author(s):

Thomas Amelal ◽

Lukas Pietzonka ◽

Erik Rohkamm ◽

Carsten Bundesmann

Keyword(s):

Ion Beam ◽

Ion Beam Sputtering ◽

Oxygen Ions ◽

Secondary Particles ◽

Beam Sputtering

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High fluence effect on Si ripple morphology developed by low energy ion beam sputtering

10.1063/1.4810246 ◽

2013 ◽

Cited By ~ 4

Author(s):

Debasree Chowdhury ◽

Debabrata Ghose

Keyword(s):

Ion Beam ◽

Low Energy ◽

High Fluence ◽

Ion Beam Sputtering ◽

Beam Sputtering

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Topographical changes induced by low energy ion beam sputtering at oblique incidence

Radiation Effects ◽

10.1080/00337578308228185 ◽

1983 ◽

Vol 77 (3-4) ◽

pp. 177-193 ◽

Cited By ~ 11

Author(s):

Ren Cong-xin ◽

Chen Guo-Ming ◽

Fu Xtn-Ding ◽

Yang Jie ◽

Fang Hong-Li ◽

...

Keyword(s):

Oblique Incidence ◽

Ion Beam ◽

Low Energy ◽

Ion Beam Sputtering ◽

Beam Sputtering

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Silicon nitride layers on gallium arsenide by low‐energy ion beam sputtering

Journal of Vacuum Science and Technology ◽

10.1116/1.569904 ◽

1979 ◽

Vol 16 (2) ◽

pp. 189-192 ◽

Cited By ~ 10

Author(s):

L. E. Bradley ◽

J. R. Sites

Keyword(s):

Gallium Arsenide ◽

Silicon Nitride ◽

Ion Beam ◽

Low Energy ◽

Ion Beam Sputtering ◽

Beam Sputtering ◽

Nitride Layers

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A reliable fabrication technique for very low resistance ohmic contacts to p-InGaAs using low energy Ar/sup +/ ion beam sputtering

[Proceedings 1991] Third International Conference Indium Phosphide and Related Materials ◽

10.1109/iciprm.1991.147349 ◽

2002 ◽

Cited By ~ 1

Author(s):

G. Stareev ◽

A. Umbach ◽

F. Fidorra ◽

H. Roehle

Keyword(s):

Ohmic Contacts ◽

Ion Beam ◽

Low Energy ◽

Fabrication Technique ◽

Ion Beam Sputtering ◽

Low Resistance ◽

Beam Sputtering

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A reliable fabrication technique for very low resistance ohmic contacts top-InGaAs using low energy Ar+ ion beam sputtering

Journal of Electronic Materials ◽

10.1007/bf03030207 ◽

1991 ◽

Vol 20 (12) ◽

pp. 1059-1063 ◽

Cited By ~ 8

Author(s):

G. Stareev ◽

A. Umbach

Keyword(s):

Ohmic Contacts ◽

Ion Beam ◽

Low Energy ◽

Fabrication Technique ◽

Ion Beam Sputtering ◽

Low Resistance ◽

Beam Sputtering

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Surface morphology of molybdenum silicide films upon low-energy ion beam sputtering

Journal of Physics Condensed Matter ◽

10.1088/1361-648x/aac4f6 ◽

2018 ◽

Vol 30 (26) ◽

pp. 264003 ◽

Cited By ~ 5

Author(s):

R Gago ◽

M Jaafar ◽

F J Palomares

Keyword(s):

Surface Morphology ◽

Ion Beam ◽

Low Energy ◽

Molybdenum Silicide ◽

Ion Beam Sputtering ◽

Beam Sputtering

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Formation of nanoripples on amorphous alumina thin films during low-energy ion-beam sputtering: Experiments and simulations

Physical Review B ◽

10.1103/physrevb.95.085412 ◽

2017 ◽

Vol 95 (8) ◽

Cited By ~ 12

Author(s):

D. Babonneau ◽

E. Vandenhecke ◽

S. Camelio

Keyword(s):

Thin Films ◽

Ion Beam ◽

Low Energy ◽

Ion Beam Sputtering ◽

Beam Sputtering ◽

Amorphous Alumina

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Destructive and constructive routes to prepare nanostructures on surfaces by low-energy ion beam sputtering

10.1117/12.2236472 ◽

2016 ◽

Author(s):

Bernd Rauschenbach ◽

Frank Frost

Keyword(s):

Ion Beam ◽

Low Energy ◽

Ion Beam Sputtering ◽

Beam Sputtering

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SIMS depth profiling and topography studies of repetitive III–V trenches under low energy oxygen ion beam sputtering

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ◽

10.1116/1.4944632 ◽

2016 ◽

Vol 34 (3) ◽

pp. 03H131

Author(s):

Viktoriia Gorbenko ◽

Franck Bassani ◽

Alexandre Merkulov ◽

Thierry Baron ◽

Mickael Martin ◽

...

Keyword(s):

Ion Beam ◽

Depth Profiling ◽

Low Energy ◽

Ion Beam Sputtering ◽

Oxygen Ion ◽

Beam Sputtering ◽

Sims Depth Profiling

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