Effect of radio frequency bias power on SiO[sub 2] feature etching in inductively coupled fluorocarbon plasmas
2000 ◽
Vol 18
(2)
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pp. 848
◽
2000 ◽
Vol 18
(2)
◽
pp. 856
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Keyword(s):
2015 ◽
Vol 24
(4)
◽
pp. 044007
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Keyword(s):
Numerical simulation of aerosol droplets desolvation in a radio frequency inductively coupled plasma
2003 ◽
Vol 58
(11)
◽
pp. 1959-1977
◽
Keyword(s):
1997 ◽
Vol 68
(6)
◽
pp. 2381-2383
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