Recent advances in secondary ion mass spectrometry to characterize ultralow energy ion implants

Victor K. F. Chia; Gary R. Mount; Michael J. Edgell; Charles W. Magee

doi:10.1116/1.590916

Recent advances in secondary ion mass spectrometry to characterize ultralow energy ion implants

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.590916 ◽

1999 ◽

Vol 17 (5) ◽

pp. 2345 ◽

Cited By ~ 18

Author(s):

Victor K. F. Chia ◽

Gary R. Mount ◽

Michael J. Edgell ◽

Charles W. Magee

Keyword(s):

Mass Spectrometry ◽

Secondary Ion Mass Spectrometry ◽

Ultralow Energy ◽

Recent Advances ◽

Ion Mass Spectrometry ◽

Secondary Ion

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Ultralow energy boron implants in silicon characterization by nonoxidizing secondary ion mass spectrometry analysis and soft x-ray grazing incidence x-ray fluorescence techniques

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ◽

10.1116/1.3292638 ◽

2010 ◽

Vol 28 (1) ◽

pp. C1C84-C1C89 ◽

Cited By ~ 7

Author(s):

Damiano Giubertoni ◽

Erica Iacob ◽

P. Hoenicke ◽

B. Beckhoff ◽

Giancarlo Pepponi ◽

...

Keyword(s):

Mass Spectrometry ◽

Secondary Ion Mass Spectrometry ◽

Grazing Incidence ◽

Mass Spectrometry Analysis ◽

X Ray ◽

Spectrometry Analysis ◽

Ultralow Energy ◽

Fluorescence Techniques ◽

Ion Mass Spectrometry ◽

Secondary Ion

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Dynamic Secondary Ion Mass Spectrometry (SIMS) Imaging of Materials for the Nuclear Industry: Historical Perspectives and Recent Advances

Microscopy and Microanalysis ◽

10.1017/s1431927617011709 ◽

2017 ◽

Vol 23 (S1) ◽

pp. 2208-2209

Author(s):

G. McMahon ◽

B.D. Miller ◽

M.G. Burke

Keyword(s):

Mass Spectrometry ◽

Secondary Ion Mass Spectrometry ◽

Nuclear Industry ◽

Historical Perspectives ◽

Recent Advances ◽

Ion Mass Spectrometry ◽

Secondary Ion

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Overcoming Low Ge Ionization and Erosion Rate Variation for Quantitative Ultralow Energy Secondary Ion Mass Spectrometry Depth Profiles of Si1–xGex/Ge Quantum Well Structures

Analytical Chemistry ◽

10.1021/ac202929x ◽

2012 ◽

Vol 84 (5) ◽

pp. 2292-2298 ◽

Cited By ~ 6

Author(s):

Richard J. H. Morris ◽

Mark G. Dowsett ◽

Richard Beanland ◽

Andrew Dobbie ◽

Maksym Myronov ◽

...

Keyword(s):

Mass Spectrometry ◽

Quantum Well ◽

Erosion Rate ◽

Secondary Ion Mass Spectrometry ◽

Rate Variation ◽

Quantum Well Structures ◽

Depth Profiles ◽

Ultralow Energy ◽

Ion Mass Spectrometry ◽

Secondary Ion

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Secondary ion mass spectrometry depth profiling of ultralow-energy ion implants: Problems and solutions

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.589798 ◽

1998 ◽

Vol 16 (1) ◽

pp. 298 ◽

Cited By ~ 14

Author(s):

J. G. M. van Berkum

Keyword(s):

Mass Spectrometry ◽

Secondary Ion Mass Spectrometry ◽

Depth Profiling ◽

Ultralow Energy ◽

Ion Mass Spectrometry ◽

Problems And Solutions ◽

Secondary Ion

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Depth resolution studies in SiGe delta-doped multilayers using ultralow-energy Cs[sup +] secondary ion mass spectrometry

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ◽

10.1116/1.2429671 ◽

2007 ◽

Vol 25 (1) ◽

pp. 277 ◽

Cited By ~ 7

Author(s):

A. R. Chanbasha ◽

A. T. S. Wee

Keyword(s):

Mass Spectrometry ◽

Secondary Ion Mass Spectrometry ◽

Depth Resolution ◽

Ultralow Energy ◽

Ion Mass Spectrometry ◽

Secondary Ion

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Depth resolution studies in SiGe delta-doped multilayers using ultralow-energy O[sub 2]+] secondary-ion-mass spectrometry

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ◽

10.1116/1.2167986 ◽

2006 ◽

Vol 24 (2) ◽

pp. 547 ◽

Cited By ~ 5

Author(s):

A. R. Chanbasha ◽

A. T. S. Wee

Keyword(s):

Mass Spectrometry ◽

Secondary Ion Mass Spectrometry ◽

Depth Resolution ◽

Ultralow Energy ◽

Ion Mass Spectrometry ◽

Secondary Ion

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ChemInform Abstract: Recent Advances in Secondary Ion Mass Spectrometry of Solid Acid Catalysts: Large Zeolite Crystals under Bombardment.

ChemInform ◽

10.1002/chin.201419237 ◽

2014 ◽

Vol 45 (19) ◽

pp. no-no

Author(s):

Jan P. Hofmann ◽

Marcus Rohnke ◽

Bert M. Weckhuysen

Keyword(s):

Mass Spectrometry ◽

Solid Acid ◽

Secondary Ion Mass Spectrometry ◽

Solid Acid Catalysts ◽

Acid Catalysts ◽

Recent Advances ◽

Ion Mass Spectrometry ◽

Secondary Ion ◽

Zeolite Crystals

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Recent Advances in Biological Tissue Imaging with Time-of-Flight Secondary Ion Mass Spectrometry: Polyatomic Ion Sources, Sample Preparation, and Applications

Current Pharmaceutical Design ◽

10.2174/138161207782360618 ◽

2007 ◽

Vol 13 (32) ◽

pp. 3335-3343 ◽

Cited By ~ 39

Author(s):

Alain Brunelle ◽

Olivier Laprevote

Keyword(s):

Mass Spectrometry ◽

Sample Preparation ◽

Biological Tissue ◽

Secondary Ion Mass Spectrometry ◽

Time Of Flight ◽

Ion Sources ◽

Tissue Imaging ◽

Recent Advances ◽

Ion Mass Spectrometry ◽

Secondary Ion

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Ion yields and erosion rates for Si1−xGex(0≤x≤1) ultralow energy O2+ secondary ion mass spectrometry in the energy range of 0.25–1 keV

Journal of Applied Physics ◽

10.1063/1.3139279 ◽

2009 ◽

Vol 105 (11) ◽

pp. 114316 ◽

Cited By ~ 16

Author(s):

R. J. H. Morris ◽

M. G. Dowsett

Keyword(s):

Mass Spectrometry ◽

Energy Range ◽

Secondary Ion Mass Spectrometry ◽

Ultralow Energy ◽

Erosion Rates ◽

Ion Mass Spectrometry ◽

Ion Yields ◽

Secondary Ion

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Ultralow energy secondary ion mass spectrometry and transient yields at the silicon surface

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.589799 ◽

1998 ◽

Vol 16 (1) ◽

pp. 302 ◽

Cited By ~ 15

Author(s):

M. G. Dowsett

Keyword(s):

Mass Spectrometry ◽

Silicon Surface ◽

Secondary Ion Mass Spectrometry ◽

Ultralow Energy ◽

Ion Mass Spectrometry ◽

Secondary Ion

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