Determination of silicon oxide layer thickness by time-of-flight secondary ion mass spectroscopy

1999 ◽  
Vol 17 (5) ◽  
pp. 2191 ◽  
Author(s):  
O. Brox ◽  
K. Iltgen ◽  
S. Hellweg ◽  
A. Benninghoven
Keyword(s):  
Oxide Layer ◽  
Layer Thickness ◽  
Mass Spectroscopy ◽  
Silicon Oxide ◽  
Time Of Flight ◽  
Oxide Layer Thickness ◽  
Secondary Ion Mass Spectroscopy ◽  
Silicon Oxide Layer ◽  
Secondary Ion

Determination of Ca diffusion in YBCO films by Secondary Ion Mass Spectroscopy

2003 ◽  
Vol 164 (3-4) ◽  
pp. 149-158 ◽  
Author(s):  
A.V. Berenov ◽  
S.R. Foltyn ◽  
C.W. Schneider ◽  
P.A. Warburton ◽  
J.L. MacManus-Driscoll
Keyword(s):  
Mass Spectroscopy ◽  
Secondary Ion Mass Spectroscopy ◽  
Ybco Films ◽  
Secondary Ion

An investigation of the wear track on DLC (a-C:H) film by time-of-flight secondary ion mass spectroscopy

2001 ◽  
Vol 146-147 ◽  
pp. 378-383 ◽  
Author(s):  
Haruyo Fukui ◽  
Miki Irie ◽  
Yoshiharu Utsumi ◽  
Kazuhiko Oda ◽  
Hisanori Ohara
Keyword(s):  
Mass Spectroscopy ◽  
Wear Track ◽  
Time Of Flight ◽  
Secondary Ion Mass Spectroscopy ◽  
Secondary Ion
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