Elimination of gate oxide damage during electron cyclotron resonance plasma etching of the tungsten polycide gate structure (WSi/poly-Si)
1998 ◽
Vol 16
(5)
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pp. 2720
2002 ◽
Vol 31
(7)
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pp. 749-753
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2017 ◽
Vol 35
(6)
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pp. 061303
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1996 ◽
Vol 14
(5)
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pp. 2827-2834
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1995 ◽
Vol 24
(9)
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pp. 1201-1206
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