Mechanism of selective SiO2/Si etching with fluorocarbon gases (CF4, C4F8) and hydrogen mixture in electron cyclotron resonance plasma etching system

1996 ◽  
Vol 14 (5) ◽  
pp. 2827-2834 ◽  
Author(s):  
Hyun‐Ho Doh ◽  
Jung‐Hun Kim ◽  
Seok‐Hyun Lee ◽  
Ki‐Woong Whang
1990 ◽  
Vol 56 (15) ◽  
pp. 1424-1426 ◽  
Author(s):  
S. J. Pearton ◽  
U. K. Chakrabarti ◽  
A. P. Kinsella ◽  
D. Johnson ◽  
C. Constantine

1996 ◽  
Vol 69 (10) ◽  
pp. 1426-1428 ◽  
Author(s):  
C. B. Vartuli ◽  
S. J. Pearton ◽  
J. W. Lee ◽  
J. Hong ◽  
J. D. MacKenzie ◽  
...  

2017 ◽  
Vol 35 (6) ◽  
pp. 061303 ◽  
Author(s):  
Sara E. Harrison ◽  
Lars F. Voss ◽  
Andrea M. Torres ◽  
Clint D. Frye ◽  
Qinghui Shao ◽  
...  

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