Polycrystalline silicon field emitter arrays by silicidation-sharpening technique at low temperature

Jin Ho Lee

doi:10.1116/1.589902

Polycrystalline silicon field emitter arrays by silicidation-sharpening technique at low temperature

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.589902 ◽

1998 ◽

Vol 16 (2) ◽

pp. 773

Author(s):

Jin Ho Lee

Keyword(s):

Low Temperature ◽

Polycrystalline Silicon ◽

Field Emitter ◽

Field Emitter Arrays

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Polycrystalline Silicon Field Emitter Arrays By Silicidation-sharpening Technique At Low Temperature

10th International Conference on Vacuum Microelectronics ◽

10.1109/ivmc.1997.627387 ◽

1997 ◽

Keyword(s):

Low Temperature ◽

Polycrystalline Silicon ◽

Field Emitter ◽

Field Emitter Arrays

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Process design and emission properties of gated n[sup +] polycrystalline silicon field emitter arrays for flat-panel display applications

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.589602 ◽

1997 ◽

Vol 15 (2) ◽

pp. 472 ◽

Cited By ~ 31

Author(s):

Hyung Soo Uh

Keyword(s):

Process Design ◽

Polycrystalline Silicon ◽

Flat Panel Display ◽

Flat Panel ◽

Field Emitter ◽

Emission Properties ◽

Field Emitter Arrays

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Fabrication of metal field emitter arrays on polycrystalline silicon

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.589601 ◽

1997 ◽

Vol 15 (2) ◽

pp. 468 ◽

Cited By ~ 3

Author(s):

II Hwan Kim

Keyword(s):

Polycrystalline Silicon ◽

Field Emitter ◽

Field Emitter Arrays

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Electron emission from polycrystalline silicon field emitter arrays coated with a thin diamond-like carbon layer

Eleventh International Vacuum Microelectronics Conference. IVMC'98 (Cat. No.98TH8382) ◽

10.1109/ivmc.1998.728697 ◽

2002 ◽

Author(s):

H. Mimura ◽

K. Yokoo ◽

G. Hashiguchi ◽

M. Okada ◽

T. Matsumoto ◽

...

Keyword(s):

Electron Emission ◽

Polycrystalline Silicon ◽

Carbon Layer ◽

Diamond Like Carbon ◽

Field Emitter ◽

Field Emitter Arrays

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Enhancement in electron emission from polycrystalline silicon field emitter arrays coated with diamondlike carbon

Journal of Applied Physics ◽

10.1063/1.368495 ◽

1998 ◽

Vol 84 (6) ◽

pp. 3378-3381 ◽

Cited By ~ 4

Author(s):

Hidenori Mimura ◽

Gen Hashiguchi ◽

Morihiro Okada ◽

Takahiro Matsumoto ◽

Masaki Tanaka ◽

...

Keyword(s):

Electron Emission ◽

Polycrystalline Silicon ◽

Field Emitter ◽

Field Emitter Arrays ◽

Diamondlike Carbon

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Polycrystalline Silicon Field Emitter Arrays With A Gated Structure

Proceedings of the Fourth Asian Symposium on Information Display ◽

10.1109/asid.1997.631422 ◽

1997 ◽

Cited By ~ 1

Author(s):

Yoon-Ho Song ◽

Jin Ho Lee ◽

Sung Weon Kang ◽

Byoung-Gon Yu ◽

Kyoung Ik Cho ◽

...

Keyword(s):

Polycrystalline Silicon ◽

Field Emitter ◽

Field Emitter Arrays

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Fabrication of Polycrystalline Silicon Field Emitter Arrays with Hafnium Carbide Coating for Thin-Film-Transistor Controlled Field Emission Displays

Japanese Journal of Applied Physics ◽

10.1143/jjap.43.3919 ◽

2004 ◽

Vol 43 (6B) ◽

pp. 3919-3922 ◽

Cited By ~ 13

Author(s):

Masayoshi Nagao ◽

Yutaka Sacho ◽

Takanobu Sato ◽

Takashi Matsukawa ◽

Seigo Kanemaru ◽

...

Keyword(s):

Thin Film ◽

Field Emission ◽

Polycrystalline Silicon ◽

Thin Film Transistor ◽

Carbide Coating ◽

Hafnium Carbide ◽

Field Emitter ◽

Field Emitter Arrays ◽

Field Emission Displays

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Fabrication and characterization of gated n/sup +/ polycrystalline silicon field emitter arrays

9th International Vacuum Microelectronics Conference ◽

10.1109/ivmc.1996.601855 ◽

2002 ◽

Author(s):

Hyung Soo Uh ◽

Sang Jik Kwon ◽

Jong Duk Lee ◽

Hen Suh Park

Keyword(s):

Polycrystalline Silicon ◽

Field Emitter ◽

Field Emitter Arrays ◽

Fabrication And Characterization

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Field-Emitter Arrays for RF Vacuum Microelectronics

10.21236/ada248726 ◽

1992 ◽

Author(s):

C. A. Spindt ◽

A. Rosengreen

Keyword(s):

Field Emitter ◽

Field Emitter Arrays ◽

Vacuum Microelectronics

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Structural properties of polycrystalline silicon films prepared at low temperature by plasma chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.349732 ◽

1991 ◽

Vol 70 (12) ◽

pp. 7374-7381 ◽

Cited By ~ 94

Author(s):

H. Kakinuma ◽

M. Mohri ◽

M. Sakamoto ◽

T. Tsuruoka

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Structural Properties ◽

Vapor Deposition ◽

Polycrystalline Silicon ◽

Chemical Vapor ◽

Silicon Films ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Polycrystalline Silicon Films

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