Enhanced degradation of gate oxide in negative-gas plasma during reactive ion etching

Kiyoshi Arita

doi:10.1116/1.589878

Enhanced degradation of gate oxide in negative-gas plasma during reactive ion etching

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.589878 ◽

1998 ◽

Vol 16 (2) ◽

pp. 670

Author(s):

Kiyoshi Arita

Keyword(s):

Reactive Ion Etching ◽

Gate Oxide ◽

Ion Etching ◽

Gas Plasma ◽

Enhanced Degradation

Download Full-text

Effect of oxygen concentration on the spike formation during reactive ion etching of SiC using the mixed gas plasma of NF3 and O2

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.2699473 ◽

2007 ◽

Vol 25 (2) ◽

pp. 391-400 ◽

Cited By ~ 6

Author(s):

A. Tasaka ◽

E. Watanabe ◽

T. Kai ◽

W. Shimizu ◽

T. Kanatani ◽

...

Keyword(s):

Oxygen Concentration ◽

Reactive Ion Etching ◽

Mixed Gas ◽

Ion Etching ◽

Gas Plasma ◽

Effect Of Oxygen

Download Full-text

Effect of NF3 Gas Pressure and Crystallinity of SiC on Reactive Ion Etching of SiC Surface Using NF3 Gas Plasma in Box-Type Chamber

ECS Meeting Abstracts ◽

10.1149/ma2009-02/2/176 ◽

2009 ◽

Keyword(s):

Reactive Ion Etching ◽

Gas Pressure ◽

Ion Etching ◽

Gas Plasma

Download Full-text

Etching characteristics of LiNbO3 crystal by fluorine gas plasma reactive ion etching

Surface and Coatings Technology ◽

10.1016/s0257-8972(03)00070-7 ◽

2003 ◽

Vol 169-170 ◽

pp. 203-207 ◽

Cited By ~ 10

Author(s):

Masashi Tamura ◽

Shinzo Yoshikado

Keyword(s):

Reactive Ion Etching ◽

Linbo3 Crystal ◽

Ion Etching ◽

Gas Plasma

Download Full-text

Surface evaluation of LiNbO3 and LiTaO3 crystals etched using fluorine system gas plasma reactive ion etching

Electrical Engineering in Japan ◽

10.1002/eej.10365 ◽

2004 ◽

Vol 149 (2) ◽

pp. 18-24

Author(s):

Takahiro Fujii ◽

Shinzo Yoshikado

Keyword(s):

Reactive Ion Etching ◽

Ion Etching ◽

Gas Plasma

Download Full-text

Characterization of reactive ion etching of polysilicon over gate oxide for failure mode analysis deprocessing

Proceedings of the 9th International Symposium on the Physical and Failure Analysis of Integrated Circuits (Cat. No.02TH8614) ◽

10.1109/ipfa.2002.1025618 ◽

2003 ◽

Author(s):

Huixian Wu ◽

J. Cargo ◽

J. Serpiello ◽

J. Mcginn

Keyword(s):

Failure Mode ◽

Reactive Ion Etching ◽

Gate Oxide ◽

Mode Analysis ◽

Ion Etching ◽

Failure Mode Analysis

Download Full-text

Characteristics of gate oxide surface material after exposure to magnetron-enhanced reactive ion etching plasma

10.1117/12.48901 ◽

1991 ◽

Cited By ~ 1

Author(s):

Jennifer M. Webb ◽

Zahra H. Amini

Keyword(s):

Reactive Ion Etching ◽

Gate Oxide ◽

Oxide Surface ◽

Surface Material ◽

Ion Etching

Download Full-text

Reactive ion etching of AlxGa1−xN/GaN heterostructure using Cl2, BCl3/Ar gas plasma

The Eighth International Conference on Advanced Semiconductor Devices and Microsystems ◽

10.1109/asdam.2010.5666352 ◽

2010 ◽

Author(s):

W. Oleszkiewicz ◽

J. Gryglewicz ◽

B. Paszkiewicz ◽

R. Paszkiewicz ◽

A. Szyszka ◽

...

Keyword(s):

Reactive Ion Etching ◽

Ion Etching ◽

Gas Plasma ◽

Ar Gas ◽

Gan Heterostructure

Download Full-text

Etching characteristics of LiNbO3 crystal by fluorine gas plasma reactive ion etching

Science and Technology of Advanced Materials ◽

10.1016/s1468-6996(01)00138-3 ◽

2001 ◽

Vol 2 (3-4) ◽

pp. 563-569 ◽

Cited By ~ 11

Author(s):

Tumura Masashi ◽

Shinzo Yoshikado

Keyword(s):

Reactive Ion Etching ◽

Linbo3 Crystal ◽

Ion Etching ◽

Gas Plasma

Download Full-text

Magnetron Reactive Ion Etching of GaAs and AIGaAs in CH4/H2/Ar Plasmas.

10.21236/ada310955 ◽

1996 ◽

Author(s):

George F. McLane ◽

Paul Cooke ◽

Robert P. Moerkirk

Keyword(s):

Reactive Ion Etching ◽

Ion Etching

Download Full-text

Modification of the n-Surface Profile of AlGaInN LEDs by Changing the Gas-Mixture Composition During Reactive Ion Etching

Semiconductors ◽

10.1134/s1063782620060111 ◽

2020 ◽

Vol 54 (6) ◽

pp. 672-676

Author(s):

L. K. Markov ◽

I. P. Smirnova ◽

M. V. Kukushkin ◽

A. S. Pavluchenko

Keyword(s):

Reactive Ion Etching ◽

Surface Profile ◽

Mixture Composition ◽

Gas Mixture ◽

Ion Etching

Download Full-text