Design and implementation of a real-time hierarchical parallel postprocessor for 100 keV electron beam lithography

1997 ◽  
Vol 15 (6) ◽  
pp. 2204 ◽  
Author(s):  
Lawrence P. Muray
Keyword(s):  
Electron Beam ◽  
Real Time ◽  
Electron Beam Lithography ◽  
Design And Implementation

Real-time dose control for electron-beam lithography

2020 ◽  
Vol 32 (9) ◽  
pp. 095302
Author(s):  
Yugu Yang-Keathley ◽  
Stephen A Maloney ◽  
J Todd Hastings
Keyword(s):  
Electron Beam ◽  
Real Time ◽  
Electron Beam Lithography ◽  
Dose Control ◽  
Time Dose

Lithography below 100 nm

1983 ◽  
Vol 41 ◽  
pp. 96-99
Author(s):  
L. D. Jackel
Keyword(s):  
Spatial Distribution ◽  
Electron Beam ◽  
Electron Scattering ◽  
Electron Beam Lithography ◽  
Substrate Material ◽  
Local Electron ◽  
Electron Dose ◽  
Positive Resist ◽  
Exposure Process

Most production electron beam lithography systems can pattern minimum features a few tenths of a micron across. Linewidth in these systems is usually limited by the quality of the exposing beam and by electron scattering in the resist and substrate. By using a smaller spot along with exposure techniques that minimize scattering and its effects, laboratory e-beam lithography systems can now make features hundredths of a micron wide on standard substrate material. This talk will outline sane of these high- resolution e-beam lithography techniques.We first consider parameters of the exposure process that limit resolution in organic resists. For concreteness suppose that we have a “positive” resist in which exposing electrons break bonds in the resist molecules thus increasing the exposed resist's solubility in a developer. Ihe attainable resolution is obviously limited by the overall width of the exposing beam, but the spatial distribution of the beam intensity, the beam “profile” , also contributes to the resolution. Depending on the local electron dose, more or less resist bonds are broken resulting in slower or faster dissolution in the developer.

Fabrication of Si photonic waveguides by electron beam lithography using improved proximity effect correction

2020 ◽  
Vol 59 (12) ◽  
pp. 126502
Author(s):  
Moataz Eissa ◽  
Takuya Mitarai ◽  
Tomohiro Amemiya ◽  
Yasuyuki Miyamoto ◽  
Nobuhiko Nishiyama
Keyword(s):  
Electron Beam ◽  
Proximity Effect ◽  
Electron Beam Lithography ◽  
Photonic Waveguides ◽  
Proximity Effect Correction

Design and Implementation of Low Bit-rate Real-time Video Encoder Based on DSP

2011 ◽  
Vol 30 (4) ◽  
pp. 945-948
Author(s):  
Shao-hua Liu ◽  
Zhi-hui Xiong ◽  
Wei-dong Bao ◽  
Mao-jun Zhang
Keyword(s):  
Real Time ◽  
Bit Rate ◽  
Video Encoder ◽  
Low Bit Rate ◽  
Design And Implementation
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