Comparison of advanced plasma sources for etching applications. V. Polysilicon etching rate, uniformity, profile control, and bulk plasma properties in a helical resonator plasma source
1996 ◽
Vol 14
(4)
◽
pp. 2510
◽
Keyword(s):
1994 ◽
Vol 12
(4)
◽
pp. 2310
◽
Keyword(s):
2003 ◽
Vol 58
(8)
◽
pp. 1417-1433
◽
2000 ◽
Vol 18
(5)
◽
pp. 2224
◽
Keyword(s):
2013 ◽
Vol 84
(1)
◽
pp. 013307
◽
2016 ◽
Vol 50
(4)
◽
pp. 308-321
◽
2006 ◽
Vol 201
(1-2)
◽
pp. 408-412
◽
2005 ◽
Vol 110
(A7)
◽