Comparison of advanced plasma sources for etching applications. I. Etching rate, uniformity, and profile control in a helicon and a multiple electron cyclotron resonance source

I. Tepermeister

doi:10.1116/1.587758

Comparison of advanced plasma sources for etching applications. I. Etching rate, uniformity, and profile control in a helicon and a multiple electron cyclotron resonance source

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.587758 ◽

1994 ◽

Vol 12 (4) ◽

pp. 2310 ◽

Cited By ~ 21

Author(s):

I. Tepermeister

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Etching Rate ◽

Electron Cyclotron ◽

Plasma Sources ◽

Profile Control

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Electron Cyclotron Resonance Plasma Sources and Their Use in Plasma-Assisted Chemical Vapor Deposition of Thin Films

Physics of Thin Films - Plasma Sources for Thin Film Deposition and Etching ◽

10.1016/b978-0-08-092513-4.50007-6 ◽

1994 ◽

pp. 121-233 ◽

Cited By ~ 8

Author(s):

OLEG A. POPOV

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Sources ◽

Resonance Plasma

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Numerical modeling of the effect of mirror magnetic field strength on electron distributions in electron cyclotron resonance plasma sources

Thin Solid Films ◽

10.1016/j.tsf.2020.138396 ◽

2020 ◽

Vol 714 ◽

pp. 138396

Author(s):

Bin Zhang ◽

Xiaobing Zhang

Keyword(s):

Magnetic Field ◽

Numerical Modeling ◽

Field Strength ◽

Magnetic Field Strength ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Plasma Sources ◽

Electron Distributions ◽

Resonance Plasma

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Poly‐Si etching using electron cyclotron resonance microwave plasma sources with multipole confinement

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.578242 ◽

1992 ◽

Vol 10 (4) ◽

pp. 1295-1302 ◽

Cited By ~ 4

Author(s):

S. M. Gorbatkin ◽

L. A. Berry ◽

John Swyers

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Microwave Plasma ◽

Electron Cyclotron ◽

Plasma Sources ◽

Resonance Microwave

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ELECTRON TEMPERATURE PROFILE CONTROL BY ELECTRON CYCLOTRON RESONANCE HEATING

Heating in Toroidal Plasmas 1982 ◽

10.1016/b978-1-4832-8428-6.50084-9 ◽

1982 ◽

pp. 741-748

Author(s):

F. De Luca ◽

A. Jacchia ◽

E. Lazzaro ◽

G. Ramponi

Keyword(s):

Electron Temperature ◽

Temperature Profile ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Heating ◽

Profile Control

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Contamination by sputtering in mirror field electron cyclotron resonance microwave plasma sources

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.577872 ◽

1992 ◽

Vol 10 (5) ◽

pp. 3104-3113 ◽

Cited By ~ 16

Author(s):

S. M. Gorbatkin ◽

L. A. Berry

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Microwave Plasma ◽

Electron Cyclotron ◽

Plasma Sources ◽

Field Electron ◽

Resonance Microwave

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Comparison of advanced plasma sources for etching applications. IV. Plasma induced damage in a helicon and a multipole electron cyclotron resonance source

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.587297 ◽

1994 ◽

Vol 12 (3) ◽

pp. 1340 ◽

Cited By ~ 14

Author(s):

N. Blayo

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Plasma Sources

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Study on the Distribution Control of Etching Rate and Critical Dimensions in Microwave Electron Cyclotron Resonance Plasmas for the Next Generation 450 mm Wafer Processing

Japanese Journal of Applied Physics ◽

10.1143/jjap.51.08hd01 ◽

2012 ◽

Vol 51 ◽

pp. 08HD01 ◽

Cited By ~ 1

Author(s):

Kenji Maeda ◽

Shinji Obama ◽

Hitoshi Tamura ◽

Go Miya ◽

Masaru Izawa

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Etching Rate ◽

Electron Cyclotron ◽

Next Generation ◽

Critical Dimensions ◽

Wafer Processing

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Electron Cyclotron Resonance Plasma Sources

High Density Plasma Sources ◽

10.1016/b978-081551377-3.50009-8 ◽

1995 ◽

pp. 312-379 ◽

Cited By ~ 6

Author(s):

James E. Stevens

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Sources ◽

Resonance Plasma

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Comparison of excited nitrogen sources for molecular-beam-epitaxy GaN growth: Radio frequency and electron cyclotron resonance plasma sources

Applied Physics Letters ◽

10.1063/1.126802 ◽

2000 ◽

Vol 76 (26) ◽

pp. 3861-3863 ◽

Cited By ~ 18

Author(s):

Sung-Hwan Cho ◽

Hajime Okumura ◽

Katsuhiro Akimoto

Keyword(s):

Molecular Beam Epitaxy ◽

Radio Frequency ◽

Cyclotron Resonance ◽

Molecular Beam ◽

Electron Cyclotron Resonance ◽

Nitrogen Sources ◽

Electron Cyclotron ◽

Plasma Sources ◽

Excited Nitrogen ◽

Resonance Plasma

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Characteristics of electron cyclotron resonance plasma sources

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.575816 ◽

1989 ◽

Vol 7 (3) ◽

pp. 894-898 ◽

Cited By ~ 76

Author(s):

O. A. Popov

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Sources ◽

Resonance Plasma

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