Reticle fabrication by high acceleration voltage electron beam: Representative figure method for proximity effect correction [VI]

1996 ◽  
Vol 14 (4) ◽  
pp. 2474 ◽  
Author(s):  
Takayuki Abe
Keyword(s):  
Electron Beam ◽  
Proximity Effect ◽  
Voltage Electron ◽  
High Acceleration ◽  
Proximity Effect Correction ◽  
Acceleration Voltage

Reduction of long range fogging effect in a high acceleration voltage electron beam mask writing system

1999 ◽  
Vol 17 (6) ◽  
pp. 2936 ◽  
Author(s):  
Munehiro Ogasawara ◽  
Naoharu Shimomura ◽  
Jun Takamatsu ◽  
Shusuke Yoshitake ◽  
Kenji Ooki ◽  
...  
Keyword(s):  
Electron Beam ◽  
Long Range ◽  
Writing System ◽  
Voltage Electron ◽  
High Acceleration ◽  
Fogging Effect ◽  
Acceleration Voltage

An Evaluation of High Acceleration Voltage Electron Beam Writing on X-Ray Masks

1998 ◽  
Vol 37 (Part 1, No. 5A) ◽  
pp. 2445-2450
Author(s):  
Koji Kise ◽  
Sunao Aya ◽  
Hideki Yabe ◽  
Kaeko Kitamura ◽  
Kenji Marumoto
Keyword(s):  
Electron Beam ◽  
X Ray ◽  
Voltage Electron ◽  
High Acceleration ◽  
Acceleration Voltage

Fabrication of Si photonic waveguides by electron beam lithography using improved proximity effect correction

2020 ◽  
Vol 59 (12) ◽  
pp. 126502
Author(s):  
Moataz Eissa ◽  
Takuya Mitarai ◽  
Tomohiro Amemiya ◽  
Yasuyuki Miyamoto ◽  
Nobuhiko Nishiyama
Keyword(s):  
Electron Beam ◽  
Proximity Effect ◽  
Electron Beam Lithography ◽  
Photonic Waveguides ◽  
Proximity Effect Correction
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