Impacts of point spread function accuracy on patterning prediction and proximity effect correction in low-voltage electron-beam–direct-write lithography

2013 ◽  
Vol 31 (2) ◽  
pp. 021605 ◽  
Author(s):  
Chun-Hung Liu ◽  
Philip C. W. Ng ◽  
Yu-Tian Shen ◽  
Sheng-Wei Chien ◽  
Kuen-Yu Tsai
Keyword(s):  
Electron Beam ◽  
Point Spread Function ◽  
Proximity Effect ◽  
Low Voltage ◽  
Direct Write ◽  
Voltage Electron ◽  
Point Spread ◽  
Spread Function ◽  
Proximity Effect Correction

scholarly journals Measurement of the Electron Beam Point Spread Function (PSF) in a Scanning Electron Microscope (SEM)

2015 ◽  
Vol 21 (S3) ◽  
pp. 699-700 ◽  
Author(s):  
Yudhishthir P. Kandel ◽  
Matthew D. Zotta ◽  
Andrew N. Caferra ◽  
Richard Moore ◽  
Eric Lifshin
Keyword(s):  
Electron Beam ◽  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Point Spread Function ◽  
Point Spread ◽  
Spread Function ◽  
Scanning Electron

Model-based proximity effect correction for electron-beam direct-write lithography

2010 ◽  
Author(s):  
Chun-Hung Liu ◽  
Pei-Lin Tien ◽  
Philip C. W. Ng ◽  
Yu-Tian Shen ◽  
Kuen-Yu Tsai
Keyword(s):  
Electron Beam ◽  
Proximity Effect ◽  
Direct Write ◽  
Model Based ◽  
Proximity Effect Correction
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