Si nanostructures fabricated by electron beam lithography combined with image reversal process using electron cyclotron resonance plasma oxidation

K. Kurihara

doi:10.1116/1.588098

Si nanostructures fabricated by electron beam lithography combined with image reversal process using electron cyclotron resonance plasma oxidation

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.588098 ◽

1995 ◽

Vol 13 (6) ◽

pp. 2170 ◽

Cited By ~ 13

Author(s):

K. Kurihara

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Plasma Oxidation ◽

Reversal Process ◽

Image Reversal ◽

Si Nanostructures ◽

Resonance Plasma

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Low-damage electron-beam-assisted dry etching of GaAs and AlGaAs using electron cyclotron resonance plasma electron source

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.586892 ◽

1993 ◽

Vol 11 (6) ◽

pp. 2288 ◽

Cited By ~ 4

Author(s):

Heiji Watanabe

Keyword(s):

Electron Beam ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Dry Etching ◽

Plasma Electron ◽

Electron Source ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Electron Source ◽

Resonance Plasma

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Induction of octacalcium phosphate by surface modification of TiO2 film prepared by electron cyclotron resonance plasma oxidation

Interface Oral Health Science 2007 ◽

10.1007/978-4-431-76690-2_69 ◽

2008 ◽

pp. 317-321

Author(s):

Yusuke Orii ◽

Hiroshi Masumoto ◽

Takashi Goto ◽

Yoshitomo Honda ◽

Takahisa Anada ◽

...

Keyword(s):

Surface Modification ◽

Tio2 Film ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Octacalcium Phosphate ◽

Electron Cyclotron ◽

Plasma Oxidation ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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New in situ electron beam patterning process for GaAs using an electron-cyclotron-resonance plasma-oxidized mask and Cl2 gas etching

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.586032 ◽

1992 ◽

Vol 10 (6) ◽

pp. 2711 ◽

Cited By ~ 2

Author(s):

N. Takado

Keyword(s):

Electron Beam ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Electron Beam Patterning ◽

Resonance Plasma

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Electron‐beam‐assisted dry etching for GaAs using electron cyclotron resonance plasma electron source

Applied Physics Letters ◽

10.1063/1.107994 ◽

1992 ◽

Vol 61 (25) ◽

pp. 3011-3013 ◽

Cited By ~ 2

Author(s):

Heiji Watanabe ◽

Shinji Matsui

Keyword(s):

Electron Beam ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Dry Etching ◽

Plasma Electron ◽

Electron Source ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Electron Source ◽

Resonance Plasma

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Formation of high-quality silicon dioxide films by electron cyclotron resonance plasma oxidation and plasma-enhanced chemical vapour deposition

Thin Solid Films ◽

10.1016/s0040-6090(96)08902-x ◽

1997 ◽

Vol 293 (1-2) ◽

pp. 52-62 ◽

Cited By ~ 13

Author(s):

D. Landheer ◽

J.E. Hulse ◽

T. Quance

Keyword(s):

Silicon Dioxide ◽

Chemical Vapour Deposition ◽

Cyclotron Resonance ◽

Vapour Deposition ◽

Electron Cyclotron Resonance ◽

Chemical Vapour ◽

Electron Cyclotron ◽

Plasma Oxidation ◽

High Quality ◽

Resonance Plasma

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A kinetics study of the electron cyclotron resonance plasma oxidation of silicon

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.586421 ◽

1992 ◽

Vol 10 (2) ◽

pp. 611 ◽

Cited By ~ 44

Author(s):

J. Joseph

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Kinetics Study ◽

Plasma Oxidation ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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$\bf TiO_{2}$ Thin Films Formed by Electron Cyclotron Resonance Plasma Oxidation at High Temperature and Their Application to Capacitor Dielectrics

Japanese Journal of Applied Physics ◽

10.1143/jjap.33.l1248 ◽

1994 ◽

Vol 33 (Part 2, No. 9A) ◽

pp. L1248-L1250 ◽

Cited By ~ 18

Author(s):

Yoshio Abe ◽

Takuya Fukuda

Keyword(s):

Thin Films ◽

High Temperature ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Plasma Oxidation ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Electron cyclotron resonance plasma oxidation studies of InP

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.587035 ◽

1994 ◽

Vol 12 (2) ◽

pp. 540 ◽

Cited By ~ 4

Author(s):

Y. Z. Hu

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Plasma Oxidation ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Electrical Properties of Germanium Oxynitride and Its Interface with Germanium Prepared by Electron-Cyclotron-Resonance Plasma Oxidation and Nitridation

Japanese Journal of Applied Physics ◽

10.1143/jjap.45.7351 ◽

2006 ◽

Vol 45 (9B) ◽

pp. 7351-7353 ◽

Cited By ~ 9

Author(s):

Yukio Fukuda ◽

Koji Kato ◽

Hiroshi Toyota ◽

Toshiro Ono ◽

Yoshitaka Nagasato ◽

...

Keyword(s):

Electrical Properties ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Plasma Oxidation ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Insituspectroscopic ellipsometry study of the electron cyclotron resonance plasma oxidation of silicon and interfacial damage

Applied Physics Letters ◽

10.1063/1.105306 ◽

1991 ◽

Vol 59 (11) ◽

pp. 1353-1355 ◽

Cited By ~ 35

Author(s):

Y. Z. Hu ◽

J. Joseph ◽

E. A. Irene

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Plasma Oxidation ◽

Interfacial Damage ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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