Coulomb effect in cell projection lithography

1995 ◽  
Vol 13 (6) ◽  
pp. 2419 ◽  
Author(s):  
Yasunari Sohda
Keyword(s):  
Coulomb Effect ◽  
Projection Lithography

Excimer Projection Lithography at 193-nm Wavelength

1988 ◽  
Author(s):  
M. Rothschild ◽  
D. J. Ehrlich
Keyword(s):  
Projection Lithography ◽  
193 Nm

Development of data conversion system for electron beam projection lithography

2002 ◽  
Vol 20 (6) ◽  
pp. 2672 ◽  
Author(s):  
Kokoro Kato ◽  
Kuninori Nishizawa ◽  
Tamae Haruki ◽  
Tadao Inoue ◽  
Koichi Kamijo ◽  
...  
Keyword(s):  
Electron Beam ◽  
Data Conversion ◽  
Projection Lithography ◽  
Conversion System ◽  
Beam Projection

Characterization of AZ PN114 resist for soft-x-ray projection lithography

1993 ◽  
Vol 32 (34) ◽  
pp. 7044 ◽  
Author(s):  
K. Early ◽  
D. M. Tennant ◽  
D. Y. Jeon ◽  
P. P. Mulgrew ◽  
A. A. MacDowell ◽  
...  
Keyword(s):  
X Ray ◽  
Projection Lithography ◽  
Ray Projection

New mask format for low-energy electron-beam proximity projection lithography

2002 ◽  
Author(s):  
Kaoru Koike ◽  
Shinji Omori ◽  
Kazuya Iwase ◽  
Isao Ashida ◽  
Shigeru Moriya
Keyword(s):  
Electron Beam ◽  
Low Energy ◽  
Energy Electron ◽  
Projection Lithography ◽  
Low Energy Electron

Characterization of CMOS programmable multi-beam blanking arrays as used for programmable multi-beam projection lithography and resistless nanopatterning

2011 ◽  
Vol 21 (4) ◽  
pp. 045038 ◽  
Author(s):  
Stefan Eder Kapl ◽  
Hans Loeschner ◽  
Walter Piller ◽  
Martin Witt ◽  
Wolfgang Pilz ◽  
...  
Keyword(s):  
Projection Lithography ◽  
Beam Projection

Coulomb effect inhibiting spontaneous emission in charged quantum dot

2010 ◽  
Vol 97 (9) ◽  
pp. 091105 ◽  
Author(s):  
Kamil Gradkowski ◽  
Tomasz J. Ochalski ◽  
Nicola Pavarelli ◽  
David P. Williams ◽  
Guillaume Huyet ◽  
...  
Keyword(s):  
Quantum Dot ◽  
Spontaneous Emission ◽  
Coulomb Effect
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