Reactive ion etching lag on high rate oxide etching using high density plasma

1995 ◽  
Vol 13 (6) ◽  
pp. 2390 ◽  
Author(s):  
Takeshi Akimoto
Keyword(s):  
Reactive Ion Etching ◽  
High Density ◽  
High Rate ◽  
Ion Etching ◽  
Oxide Etching ◽  
Density Plasma

Evolution of etch profile in etching of CoFeB thin films using high density plasma reactive ion etching

2011 ◽  
Vol 519 (20) ◽  
pp. 6673-6677 ◽  
Author(s):  
Yu Bin Xiao ◽  
Eun Ho Kim ◽  
Seon Mi Kong ◽  
Chee Won Chung
Keyword(s):  
Thin Films ◽  
Reactive Ion Etching ◽  
High Density ◽  
Ion Etching ◽  
Etch Profile ◽  
Density Plasma

High density plasma reactive ion etching of CoFeB magnetic thin films using a CH4/Ar plasma

2012 ◽  
Vol 521 ◽  
pp. 216-221 ◽  
Author(s):  
Eun Ho Kim ◽  
Tea Young Lee ◽  
Byoung Chul Min ◽  
Chee Won Chung
Keyword(s):  
Thin Films ◽  
Reactive Ion Etching ◽  
Magnetic Thin Films ◽  
High Density ◽  
Ion Etching ◽  
Ar Plasma ◽  
Density Plasma

High density plasma reactive ion etching of Ru thin films using non-corrosive gas mixture

2015 ◽  
Vol 587 ◽  
pp. 28-33 ◽  
Author(s):  
Su Min Hwang ◽  
Adrian Adalberto Garay ◽  
Wan In Lee ◽  
Chee Won Chung
Keyword(s):  
Thin Films ◽  
Reactive Ion Etching ◽  
High Density ◽  
Gas Mixture ◽  
Ion Etching ◽  
Density Plasma

High-Rate Deposition of Amorphous Silicon Films by Microwave-Excited High-Density Plasma

2011 ◽  
Vol 50 ◽  
pp. 036502 ◽  
Author(s):  
Hirotada Inoue ◽  
Kouji Tanaka ◽  
Yuichi Sano ◽  
Takehiro Nishimura ◽  
Akinobu Teramoto ◽  
...  
Keyword(s):  
Amorphous Silicon ◽  
High Density ◽  
Silicon Films ◽  
High Rate ◽  
Density Plasma

High rate reactive ion etching of Al2O3 and Si

1980 ◽  
Vol 17 (3) ◽  
pp. 731-734 ◽  
Author(s):  
Neil Heiman ◽  
Vincent Minkiewicz ◽  
Brian Chapman
Keyword(s):  
Reactive Ion Etching ◽  
High Rate ◽  
Ion Etching

High-Rate Deposition of Amorphous Silicon Films by Microwave-Excited High-Density Plasma

2011 ◽  
Vol 50 (3R) ◽  
pp. 036502 ◽  
Author(s):  
Hirotada Inoue ◽  
Kouji Tanaka ◽  
Yuichi Sano ◽  
Takehiro Nishimura ◽  
Akinobu Teramoto ◽  
...  
Keyword(s):  
Amorphous Silicon ◽  
High Density ◽  
Silicon Films ◽  
High Rate ◽  
Density Plasma
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