Comparison of advanced plasma sources for etching applications. II. Langmuir probe studies of a helicon and a multipole electron cyclotron resonance source

1994 ◽  
Vol 12 (4) ◽  
pp. 2322 ◽  
Author(s):  
I. Tepermeister
Keyword(s):  
Langmuir Probe ◽  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Electron Cyclotron ◽  
Plasma Sources

Langmuir probe analysis of distributed electron cyclotron resonance silicon nitride deposition plasma

1998 ◽  
Vol 72 (12) ◽  
pp. 1448-1450 ◽  
Author(s):  
F. Delmotte ◽  
M. C. Hugon ◽  
B. Agius ◽  
A. M. Pointu ◽  
S. Teodoru
Keyword(s):  
Silicon Nitride ◽  
Langmuir Probe ◽  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Electron Cyclotron ◽  
Probe Analysis
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