Extremely high‐selective electron cyclotron resonance plasma etching for phosphorus‐doped polycrystalline silicon

1990 ◽  
Vol 57 (4) ◽  
pp. 403-405 ◽  
Author(s):  
Seiji Samukawa ◽  
Yasuhiro Suzuki ◽  
Masami Sasaki
Keyword(s):  
Plasma Etching ◽  
Cyclotron Resonance ◽  
Polycrystalline Silicon ◽  
Electron Cyclotron Resonance ◽  
Electron Cyclotron ◽  
Electron Cyclotron Resonance Plasma ◽  
Phosphorus Doped ◽  
Resonance Plasma

Electron cyclotron resonance plasma etching of InP in CH4/H2/Ar

1990 ◽  
Vol 56 (15) ◽  
pp. 1424-1426 ◽  
Author(s):  
S. J. Pearton ◽  
U. K. Chakrabarti ◽  
A. P. Kinsella ◽  
D. Johnson ◽  
C. Constantine
Keyword(s):  
Plasma Etching ◽  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Electron Cyclotron ◽  
Electron Cyclotron Resonance Plasma ◽  
Resonance Plasma

ICl/Ar electron cyclotron resonance plasma etching of III–V nitrides

1996 ◽  
Vol 69 (10) ◽  
pp. 1426-1428 ◽  
Author(s):  
C. B. Vartuli ◽  
S. J. Pearton ◽  
J. W. Lee ◽  
J. Hong ◽  
J. D. MacKenzie ◽  
...  
Keyword(s):  
Plasma Etching ◽  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Electron Cyclotron ◽  
Electron Cyclotron Resonance Plasma ◽  
Resonance Plasma
Sign in / Sign up

Export Citation Format

Share Document