Acid generation process by radiation-induced reaction in chemically amplified resist films

1994 ◽  
Vol 12 (6) ◽  
pp. 3879 ◽  
Author(s):  
T. Watanabe
Keyword(s):  
Generation Process ◽  
Acid Generation ◽  
Chemically Amplified ◽  
Chemically Amplified Resist ◽  
Radiation Induced ◽  
Induced Reaction

Radiation-Induced Acid Generation Reactions in Chemically Amplified Resists for Electron Beam and X-Ray Lithography

1992 ◽  
Vol 31 (Part 1, No. 12B) ◽  
pp. 4301-4306 ◽  
Author(s):  
Takahiro Kozawa ◽  
Yoichi Yoshida ◽  
Mitsuru Uesaka ◽  
Seiichi Tagawa
Keyword(s):  
Electron Beam ◽  
X Ray ◽  
Acid Generation ◽  
Chemically Amplified ◽  
Radiation Induced ◽  
Chemically Amplified Resists

Acid Generation in Chemically Amplified Resist Films

1995 ◽  
pp. 110-120
Author(s):  
Takeo Watanabe ◽  
Yoshio Yamashita ◽  
Takahiro Kozawa ◽  
Yoichi Yoshida ◽  
Seiichi Tagawa
Keyword(s):  
Acid Generation ◽  
Chemically Amplified ◽  
Chemically Amplified Resist

Chemically amplified resist technology for i-line applications

1998 ◽  
Author(s):  
Medhat A. Toukhy ◽  
Sanjay Malik ◽  
Andrew J. Blakeney ◽  
Karin R. Schlicht
Keyword(s):  
Chemically Amplified ◽  
Chemically Amplified Resist

Sub-150-nm electron-beam lithography using AZPN114 chemically amplified resist

1997 ◽  
Author(s):  
Zheng Cui ◽  
R. A. Moody ◽  
Ian M. Loader ◽  
John G. Watson ◽  
Philip D. Prewett
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Chemically Amplified ◽  
Chemically Amplified Resist

Postexposure Delay Effect on Linewidth Variation in Base Added Chemically Amplified Resist

2000 ◽  
Vol 147 (10) ◽  
pp. 3833 ◽  
Author(s):  
Chin-Yu Ku ◽  
Jia-Min Shieh ◽  
Tsann-Bim Chiou ◽  
Hwang-Kuen Lin ◽  
Tan Fu Lei
Keyword(s):  
Delay Effect ◽  
Chemically Amplified ◽  
Chemically Amplified Resist
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