Ag2Te/As2S3, a top-surface, high-contrast negative-tone resist for deep ultraviolet submicron lithography
1994 ◽
Vol 12
(1)
◽
pp. 44
◽
Study of a high contrast process for hydrogen silsesquioxane as a negative tone electron beam resist
2003 ◽
Vol 21
(5)
◽
pp. 2018
◽
1994 ◽
Vol 12
(6)
◽
pp. 3851
◽
2016 ◽
Vol 34
(6)
◽
pp. 061603
◽
1976 ◽
Vol 34
◽
pp. 572-573
Keyword(s):
1988 ◽
Vol 46
◽
pp. 94-95
1993 ◽
Vol 51
◽
pp. 1078-1079
1980 ◽
Vol 38
◽
pp. 318-319
Keyword(s):