CSAR 62 as negative-tone resist for high-contrast e-beam lithography at temperatures between 4 K and room temperature
2016 ◽
Vol 34
(6)
◽
pp. 061603
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1994 ◽
Vol 12
(1)
◽
pp. 44
◽
2019 ◽
Vol 21
(5)
◽
pp. 1801342
◽
Keyword(s):
Study of a high contrast process for hydrogen silsesquioxane as a negative tone electron beam resist
2003 ◽
Vol 21
(5)
◽
pp. 2018
◽
1973 ◽
Vol 31
◽
pp. 150-151
1982 ◽
Vol 40
◽
pp. 56-57
Keyword(s):