Single-layer chemically amplified photoresists for 193-nm lithography

1993 ◽  
Vol 11 (6) ◽  
pp. 2783 ◽  
Author(s):  
G. M. Wallraff
Keyword(s):  
Single Layer ◽  
Chemically Amplified ◽  
193 Nm

Environmental stability of 193 nm single layer chemically amplified resists

1999 ◽  
Vol 17 (1) ◽  
pp. 101 ◽  
Author(s):  
A. G. Timko ◽  
F. M. Houlihan ◽  
R. A. Cirelli ◽  
O. Nalamasu ◽  
Hiroshi Yoshino ◽  
...  
Keyword(s):  
Single Layer ◽  
Environmental Stability ◽  
Chemically Amplified ◽  
Chemically Amplified Resists ◽  
193 Nm

Novel single-layer chemically amplified resist for 193-nm lithography

1997 ◽  
Author(s):  
Sang-Jun Choi ◽  
Yool Kang ◽  
Dong-Won Jung ◽  
Chun-Geun Park ◽  
Joo-Tae Moon
Keyword(s):  
Single Layer ◽  
Chemically Amplified ◽  
Chemically Amplified Resist ◽  
193 Nm

Lithographic performance and optimization of chemically amplified single-layer resists for EUV lithography

2000 ◽  
Author(s):  
Takeo Watanabe ◽  
Hiroo Kinoshita ◽  
Atsushi Miyafuji ◽  
Shigeo Irie ◽  
Shigeru Shirayone ◽  
...  
Keyword(s):  
Single Layer ◽  
Chemically Amplified ◽  
Euv Lithography

Base additives for use in a single layer 193-nm resist based upon poly(norbornene/maleic anhydride/acrylic acid/ tert -butyl acrylate)

2001 ◽  
Author(s):  
Francis M. Houlihan ◽  
Donna Person ◽  
Omkaram Nalamasu ◽  
Ilya Rushkin ◽  
Ognian N. Dimov ◽  
...  
Keyword(s):  
Maleic Anhydride ◽  
Acrylic Acid ◽  
Butyl Acrylate ◽  
Single Layer ◽  
Tert Butyl ◽  
193 Nm

A New Single-Layer Resist for 193-nm Lithography

1996 ◽  
Vol 35 (Part 2, No. 4B) ◽  
pp. L528-L530 ◽  
Author(s):  
Koji Nozaki ◽  
Keiji Watanabe ◽  
Takahisa Namiki ◽  
Miwa Igarashi ◽  
Yoko Kuramitsu ◽  
...  
Keyword(s):  
Single Layer ◽  
193 Nm

Chemically amplified photoresists for 193-nm photolithography: Effect of molecular structure and photonic parameters on photopatterning

2010 ◽  
Vol 48 (6) ◽  
pp. 1271-1277 ◽  
Author(s):  
Hassan Ridaoui ◽  
Ali Dirani ◽  
Olivier Soppera ◽  
Esma Ismailova ◽  
Cyril Brochon ◽  
...  
Keyword(s):  
Molecular Structure ◽  
Chemically Amplified ◽  
193 Nm

Microlithographic Assessment of a Novel Family of Transparent and Etch-Resistant Chemically Amplified 193-nm Resists Based on Cyclopolymers

2001 ◽  
Vol 13 (11) ◽  
pp. 4147-4153 ◽  
Author(s):  
John M. Klopp ◽  
Dario Pasini ◽  
Jeffrey D. Byers ◽  
C. Grant Willson ◽  
Jean M. J. Fréchet
Keyword(s):  
Chemically Amplified ◽  
193 Nm

scholarly journals Single layer resists with enhanced etch resistance for 193 nm lithography.

1994 ◽  
Vol 7 (3) ◽  
pp. 507-516 ◽  
Author(s):  
ROBERT D. ALLEN ◽  
GREGORY M. WALLRAFF ◽  
RICHARD A. DIPIETRO ◽  
DONALD C. HOFER ◽  
RODERICK R. KUNZ
Keyword(s):  
Single Layer ◽  
193 Nm

Refractive index change during exposure for 193-nm chemically amplified resists

1999 ◽  
Author(s):  
Hye-Keun Oh ◽  
Young-Soo Sohn ◽  
Moon-Gyu Sung ◽  
Young-Mi Lee ◽  
Eun-Mi Lee ◽  
...  
Keyword(s):  
Refractive Index ◽  
Refractive Index Change ◽  
Index Change ◽  
Chemically Amplified ◽  
Chemically Amplified Resists ◽  
193 Nm
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