Broad area, intense electron beam source for high resolution, high throughput semiconductor lithography

Author(s):  
T-Y. Hsu
1994 ◽  
Author(s):  
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Peyman Hadizad ◽  
Rong L. Liou ◽  
Greg Roth ◽  
Martin A. Gundersen

1983 ◽  
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D Gazit ◽  
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2014 ◽  
Vol 85 (6) ◽  
pp. 066108 ◽  
Author(s):  
L. Xia ◽  
H. Zhang ◽  
A. Yang ◽  
Y. Shen ◽  
W. Wang ◽  
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2014 ◽  
Vol 9 (04) ◽  
pp. P04017-P04017 ◽  
Author(s):  
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S Mitra ◽  
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2008 ◽  
Vol 32 (10) ◽  
pp. 842-845
Author(s):  
Zhang Kai-Zhi ◽  
Zhang Huang ◽  
Long Ji-Dong ◽  
Yang Guo-Jun ◽  
He Xiao-Zhong ◽  
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1980 ◽  
Vol 48 (1) ◽  
pp. 295-300 ◽  
Author(s):  
Kazuo Imasaki ◽  
Shuji Miyamoto ◽  
Sadao Nakai ◽  
Chiyoe Yamanaka

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Naiyan Wang ◽  
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...  

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