Process control with chemical amplification resists using deep ultraviolet and x-ray radiation

1988 ◽  
Vol 6 (6) ◽  
pp. 2303 ◽  
Author(s):  
Daniel Seligson
Keyword(s):  
Process Control ◽  
X Ray ◽  
Chemical Amplification ◽  
Deep Ultraviolet

Application of x-ray fluorescence spectrometry in process control in sinter plants

1991 ◽  
Vol 20 (4) ◽  
pp. 199-201 ◽  
Author(s):  
V. V. V. Subrahmanyam ◽  
K. S. R. Krishnaiah ◽  
Y. P. Srivastava
Keyword(s):  
Process Control ◽  
Fluorescence Spectrometry ◽  
X Ray

Process Control Applications of the Peltier Cooled SI (LI) Detector Based EDXRF Spectrometer

1988 ◽  
Vol 32 ◽  
pp. 31-37
Author(s):  
Anthony R. Harding
Keyword(s):  
Process Control ◽  
Silicon Crystal ◽  
Conveyor Belt ◽  
Cryogenic Liquid ◽  
Active Species ◽  
Peltier Effect ◽  
Production Plant ◽  
Plating Bath ◽  
X Ray ◽  
On Line

AbstractThe demand for on-line analyzers capable of compositional determinations in petroleum and chemical process streams has increased dramatically in recent years. Total control of production plant processes and resources requires the analysis of feed, intermediate, and product materials. This paper will describe a rugged, on-stream energy dispersive X-ray fluorescence (EDXRF) analyzer configured for the continuous determination of composition in solid and liquid samples. The detector in the X-ray sensor is a lithium-drifted silicon crystal which is thermoelectrically cooled (Peltier effect) to achieve operational temperatures. This approach to detector cooling offers advantages over traditional cryogenic liquid cooling when EDXRF is used in the process control environment.Three applications of the thermoelectrically-cooled detector-based EDXRF spectrometer will be presented here. The first is the analysis of a catalyst solution to monitor depletion of the active species. Second, two components of a plating bath solution will be determined simultaneously in a flowing sample stream. In the third application, the spectrometer will be oriented in a downward looking configuration to monitor inorganic constituents in absorbent samples as they are transported by conveyor belt to the X-ray measurement area.

Assumed Mechanism of Polymeric Deposit Formation in Recycle Propylene Washing Column during Bulk Polymerization

2015 ◽  
Vol 756 ◽  
pp. 179-186
Author(s):  
Edward Mayer ◽  
Alla Trofimova ◽  
Vasiliy Mashukov ◽  
Alexey Pestryakov
Keyword(s):  
Differential Scanning Calorimetry ◽  
Process Control ◽  
Phase Analysis ◽  
Formation Mechanism ◽  
Bulk Polymerization ◽  
Control Methods ◽  
Scanning Calorimetry ◽  
Deposit Formation ◽  
X Ray ◽  
Analytical Process

This study presents the results of polymeric deposit analysis from propylene washing column of «Spheripol» process polymerization unit using such methods as gel-permation chromatography, differential scanning calorimetry (DSC), X-ray phase analysis, IR and NMR13C-spectroscopy and analytical process control methods. For comparison the relative data for larger volume polypropylene grades have been presented as well. Based on the findings and available similar practice in a slurry process an assumed formation mechanism was proposed for the discussion.

Dual X-ray absorptiometry quality control: Comparison of visual examination and process-control charts

2009 ◽  
Vol 11 (5) ◽  
pp. 626-637 ◽  
Author(s):  
Ying Lu ◽  
Ashwini K. Mathur ◽  
Barbara A. Blunt ◽  
Claus C. Glüer ◽  
A. Steve Will ◽  
...  
Keyword(s):  
Quality Control ◽  
Process Control ◽  
Control Charts ◽  
Visual Examination ◽  
X Ray ◽  
Process Control Charts ◽  
Control Comparison

Process Control in Aluminum Foam Production Using Real-Time X-ray Radioscopy

2002 ◽  
Vol 4 (10) ◽  
pp. 814-823 ◽  
Author(s):  
H. Stanzick ◽  
M. Wichmann ◽  
J. Weise ◽  
L. Helfen ◽  
T. Baumbach ◽  
...  
Keyword(s):  
Process Control ◽  
Real Time ◽  
Aluminum Foam ◽  
X Ray ◽  
Foam Production

A Surface-Silylated Single-Layer Resist Using Chemical Amplification for Deep-Ultraviolet Lithography: I. Limited Permeation of Si Compounds from Vapor Phase*

2000 ◽  
Vol 39 (Part 1, No. 2A) ◽  
pp. 669-674
Author(s):  
Kazuyuki Sugita ◽  
Masakuni Ikagawa ◽  
Kieko Harada ◽  
Masahito Kushida ◽  
Kyoichi Saito
Keyword(s):  
Vapor Phase ◽  
Single Layer ◽  
Ultraviolet Lithography ◽  
Chemical Amplification ◽  
Deep Ultraviolet
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