Merging focused ion beam patterning and optical lithography in device and circuit fabrication

1990 ◽  
Vol 8 (6) ◽  
pp. 1374 ◽  
Author(s):  
James E. Murguia
Keyword(s):  
Focused Ion Beam ◽  
Ion Beam ◽  
Optical Lithography ◽  
Circuit Fabrication ◽  
Ion Beam Patterning

High-speed focused-ion-beam patterning for guiding the growth of anodic alumina nanochannel arrays

2003 ◽  
Vol 82 (8) ◽  
pp. 1281-1283 ◽  
Author(s):  
N. W. Liu ◽  
A. Datta ◽  
C. Y. Liu ◽  
Y. L. Wang
Keyword(s):  
High Speed ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Anodic Alumina ◽  
Ion Beam Patterning ◽  
Nanochannel Arrays

Critical issues in the focused ion beam patterning of nanometric hole matrixes on GaAs based semiconducting devices

2006 ◽  
Vol 17 (6) ◽  
pp. 1758-1762 ◽  
Author(s):  
M Catalano ◽  
A Taurino ◽  
M Lomascolo ◽  
A Schertel ◽  
A Orchowski
Keyword(s):  
Focused Ion Beam ◽  
Ion Beam ◽  
Critical Issues ◽  
Ion Beam Patterning

A closed UHV focused ion beam patterning and MBE regrowth technique

1995 ◽  
Vol 35 (1-3) ◽  
pp. 208-213 ◽  
Author(s):  
H. Muessig ◽  
Th. Hackbarth ◽  
H. Brugger ◽  
A. Orth ◽  
J.P. Reithmaier ◽  
...  
Keyword(s):  
Focused Ion Beam ◽  
Ion Beam ◽  
Ion Beam Patterning

scholarly journals Optimization of Focused Ion Beam Patterning Parameters for Direct Integration of Plasmonic Nanostructures on Silicon Photodiodes

2021 ◽  
Vol 10 (1) ◽  
pp. 2
Author(s):  
Elia Scattolo ◽  
Alessandro Cian ◽  
Damiano Giubertoni ◽  
Giovanni Paternoster ◽  
Luisa Petti ◽  
...  
Keyword(s):  
Ion Implantation ◽  
Finite Difference Time Domain ◽  
Focused Ion Beam ◽  
Silver Film ◽  
Ion Beam ◽  
Plasmonic Nanostructures ◽  
Direct Integration ◽  
Active Device ◽  
Difference Time ◽  
Ion Beam Patterning

The possibility of integrating plasmonic nanostructures directly on an active device, such as a silicon photodetector, is a challenging task of interest in many applications. Among the available nanofabrication techniques to realize plasmonic nanostructures, Focused Ion Beam (FIB) is surely the most promising, even if it is characterized by certain limitations, such as ion implantation in the substrate. In this work, we demonstrate the direct integration of plasmonic nanostructures directly on an active Si-photodetector by patterning a silver film with FIB. To avoid ion implantation and to therefore guarantee unaltered device behavior, both the patterning parameters and the geometry of the nanostructures were implemented by Montecarlo and Finite-Difference Time-Domain simulations.

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